Title:
METHOD OF REPLICATION OF AN IMPRINT LITHOGRAPHY TEMPLATE
Document Type and Number:
WIPO Patent Application WO/2010/039226
Kind Code:
A3
Abstract:
Particles may be present on substrates and/or templates during nano-lithographic imprinting. Particles may be mitigated and/or removed using localized removal techniques and/or imprinting techniques as described.
Inventors:
RESNICK DOUGLAS J (US)
MCMACKIN IAN M (US)
SCHMID GERARD (US)
KHUSNATDINOV NIYAZ (US)
THOMPSON ECRON (US)
SREENIVASAN SIDLGATA V (US)
MCMACKIN IAN M (US)
SCHMID GERARD (US)
KHUSNATDINOV NIYAZ (US)
THOMPSON ECRON (US)
SREENIVASAN SIDLGATA V (US)
Application Number:
PCT/US2009/005386
Publication Date:
September 02, 2010
Filing Date:
September 30, 2009
Export Citation:
Assignee:
MOLECULAR IMPRINTS INC (US)
International Classes:
B29C48/76; G03F7/00
Domestic Patent References:
| WO2006131153A1 | 2006-12-14 |
Foreign References:
| US20070257396A1 | 2007-11-08 | |||
| US20070238037A1 | 2007-10-11 | |||
| US20030071016A1 | 2003-04-17 | |||
| JP2002086463A | 2002-03-26 | |||
| US20080023885A1 | 2008-01-31 |
Attorney, Agent or Firm:
WOOD, Laura (Austin, TX, US)
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