Title:
METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS
Document Type and Number:
WIPO Patent Application WO/2015/180966
Kind Code:
A3
Abstract:
A method of forming at least one lithography feature, the method comprising: providing at least one lithography recess on a substrate, the or each lithography recess comprising side-walls and a base, with the side-walls having a width therebetween; providing a self-assemblable block copolymer having first and second blocks in the or each lithography recess; causing the self-assemblable block copolymer to self-assemble into an ordered layer within the or each lithography recess, the ordered layer comprising at least a first domain of first blocks and a second domain of second blocks; causing the self-assemblable block copolymer to cross-link in a directional manner; and selectively removing the first domain to form lithography features comprised of the second domain within the or each lithography recess.
Inventors:
WUISTER SANDER FREDERIK (NL)
JEUNINK ANDRE BERNARDUS (NL)
PEETERS EMIEL (NL)
JEUNINK ANDRE BERNARDUS (NL)
PEETERS EMIEL (NL)
Application Number:
PCT/EP2015/060620
Publication Date:
January 28, 2016
Filing Date:
May 13, 2015
Export Citation:
Assignee:
ASML NETHERLANDS BV (NL)
International Classes:
G03F7/00
Domestic Patent References:
| WO2008097736A2 | 2008-08-14 | |||
| WO2012175343A1 | 2012-12-27 |
Foreign References:
| US20120041121A1 | 2012-02-16 | |||
| US20080176767A1 | 2008-07-24 | |||
| US20140248439A1 | 2014-09-04 |
Attorney, Agent or Firm:
WEENINK, Willem (P.O. Box 324, 5500 AH Veldhoven, NL)
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