METHODS AND SYSTEMS OF OBJECT BASED METROLOGY FOR ADVANCED WAFER SURFACE NANOTOPOGRAPHY

Title:

METHODS AND SYSTEMS OF OBJECT BASED METROLOGY FOR ADVANCED WAFER SURFACE NANOTOPOGRAPHY

Document Type and Number:

WIPO Patent Application WO/2012/096855

Kind Code:

A3

Abstract:

Disclosed herein is a system and method for enhanced and expanded localized geometry characterization. Objects of interest are classified according to user-defined parameters, and this enables enhanced contrast and more accurate feature detection, as well as more accurately defined feature object regions.

Inventors:

CHEN HAIGUANG (US)
SINHA JAYDEEP K (US)
KAMENSKY SERGEY (US)

Application Number:

PCT/US2012/020573

Publication Date:

November 22, 2012

Filing Date:

January 08, 2012

Export Citation:

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Assignee:

KLA TENCOR CORP (US)
CHEN HAIGUANG (US)
SINHA JAYDEEP K (US)
KAMENSKY SERGEY (US)

International Classes:

H01L21/66; H01L21/00

Foreign References:

US20090002688A1	2009-01-01
US20040206891A1	2004-10-21
US20070035322A1	2007-02-15
US20050033550A1	2005-02-10

Other References: