CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application claims priority to and the benefit of U.S. Provisional Application No. 63/238,816, filed August 31, 2021, the entire content of which is incorporated by reference herein.

FIELD

[0002] The present disclosure relates to methods and systems for performing an oxidative coupling of methane reaction to produce C2+ compounds. More particularly, the present disclosure relates to methods and systems for performing an oxidative coupling of methane reaction to produce C2+ compounds using a low temperature gas mixture feed.

BACKGROUND

[0003] It is known that methane and oxygen can be used to produce C2+ compounds (e.g., ethylene, ethane) via the oxidative coupling of methane (OCM) reaction. Although extensive research and development has been devoted to OCM technology over the last several decades, a viable OCM process has not yet been commercialized.

[0004] One of the primary obstacles to overcome in achieving a commercially viable OCM process has been the high ignition and reaction temperatures required to make the OCM reaction proceed. Conventional methods of performing an OCM reaction typically utilize a high temperature furnace to preheat the reactant feed(s) to the temperature required to ignite or “light-off’ the OCM catalyst to initiate the OCM reaction. Operation of the high temperature furnace can be quite expensive and also creates a source of emissions as the high temperature furnace burns fuel (e.g. , natural gas) to generate the required heat.

[0005] Moreover, mixing the reactant feeds (i.e., methane containing feed and oxygen containing feed) at the high temperatures required to light-off the OCM catalyst and carry out the OCM reaction can create potential process safety and operation issues. For example, mixing the reactant feeds at high temperatures can cause ignition of the mixed reactant gas feed prior to reaching the OCM catalyst bed. Such premature ignition can cause damage to the reactor as well as the OCM catalyst bed. Damage to the catalyst can impede the ability of the catalyst to light-off and initiate the OCM reaction. Furthermore, premature ignition of the mixed reactant gas feed can reduce the selectivity of the OCM reaction due to the conversion of methane to carbon dioxide and carbon monoxide instead of the desired C2+ products. In addition, a wide variety of process upsets e.g., flow upsets, temperature deviations) can lead to premature ignition of the mixed reactant gas feed. Accordingly, mixing the reactant feeds at the high temperatures required to light-off the OCM catalyst and carry out the OCM reaction may result in process safety issues.

SUMMARY

[0006] Disclosed herein are methods and systems for performing an oxidative coupling of methane reaction to produce C2+ compounds using a low temperature gas mixture feed. By providing the gas mixture feed at a low temperature (i.e., 300 °C or less), process safety is improved by avoiding the aforementioned issues associated with mixing the methane and oxygen reactant feeds at elevated temperatures (e.g., 450 °C or more). In addition, performing an oxidative coupling of methane reaction using a low temperature gas mixture feed obviates the need for a high temperature feed heater furnace and eliminates the furnace-associated air emissions from the process. Furthermore, the methods and systems of the present disclosure can promote the C2+ selectivity of the OCM reaction if hydrogen, carbon monoxide, or both are initially combusted preferentially to methane.

[0007] The present disclosure provides a method of performing an oxidative coupling of methane (OCM) reaction to produce C2+ compounds, the method comprising: (a) introducing a gas mixture feed comprising methane (CFU), oxygen (O2), hydrogen (FF), and carbon monoxide (CO) and having a temperature of less than or equal to 300 °C to an inlet of an OCM reactor, wherein the OCM reactor comprises a combustion catalyst and an OCM catalyst; (b) contacting the combustion catalyst with the gas mixture feed to combust at least a portion of the gas mixture feed and generate a heated gas mixture having a temperature of at least 450 °C; and (c) contacting the OCM catalyst with the heated gas mixture to initiate an OCM reaction and produce an OCM effluent comprising (i) C2+ compounds including ethylene and ethane, and (ii) non-C2+ impurities comprising one or more of CO, CFU, H2, and carbon dioxide (CO2).

[0008] A method according to paragraph [0007], wherein the combustion catalyst comprises a metal, a metal oxide, or a mixed metal oxide comprising at least one of platinum, chromium, copper, palladium, cobalt, iron, manganese, gold, cerium, bismuth, indium, molybdenum, rhodium, ruthenium, germanium, gadolinium, antimony, thallium, tellurium, lead, zinc, or tin.

[0009] A method according to paragraph [0007] or paragraph [0008], wherein the gas mixture feed has a temperature of 15 °C to 250 °C at the inlet of the OCM reactor.

[0010] A method according to any one of paragraphs [0007] to [0009], wherein the heated gas mixture has a temperature of 500 °C to 700 °C.

[0011] A method according to any one of paragraphs [0007] to [0010], wherein the OCM reactor further comprises at least one ignition source, wherein the at least one ignition source promotes ignition of components of the gas mixture feed.

[0012] A method according to paragraph [0011], wherein the at least one ignition source is in contact with the combustion catalyst and comprises at least one of an electrically powered cartridge heater or a steam heated pipe.

[0013] A method according to paragraph [0011], wherein the at least one ignition source is positioned upstream of both the combustion catalyst and the OCM catalyst and comprises an injection of superheated steam at a temperature of 600 °C to 1,000 °C.

[0014] A method according to any one of paragraphs [0007] to [0013], further comprising removing CO2 from the OCM effluent.

[0015] A method according to any one of paragraphs [0007] to [0014], wherein the OCM reaction is performed at a temperature of 450 °C to 950 °C.

[0016] A method according to any one of paragraphs [0007] to [0015], wherein the OCM reaction has a selectivity for C2+ compounds of at least 35%.

[0017] A method according to any one of paragraphs [0007] to [0016], further comprising separating the OCM effluent into at least (i) a first stream comprising CO, H2, and CH4 and (ii) a second stream comprising C2+ compounds including C2H4 and C2H6.

[0018] A method according to paragraph [0017], further comprising directing at least a portion of the first stream to the OCM reactor as part of the gas mixture feed. [0019] A method according to paragraph [0017] or paragraph [0018], further comprising separating the second stream to produce a third stream comprising C2H4 and a fourth stream comprising C2H6.

[0020] A method according to paragraph [0019], further comprising directing the fourth stream to a post-bed cracking unit downstream of both the combustion catalyst and the OCM catalyst.

[0021] A method according to any one of paragraphs [0007] to [0020], wherein the combustion catalyst preferentially combusts H2, CO, or both over CH4.

[0022] The present disclosure provides a method of performing an oxidative coupling of methane (OCM) reaction to produce C2+ compounds, the method comprising: (a) mixing an oxidant stream comprising oxygen (O2) having a temperature of 0 °C to 50 °C with a hydrocarbon stream comprising methane (CH4), carbon monoxide (CO), and hydrogen (H2) having a temperature of less than or equal to 300 °C to form a gas mixture feed having a temperature of less than or equal to 300 °C; (b) introducing the gas mixture feed to an inlet of an OCM reactor, wherein the OCM reactor comprises a combustion catalyst and an OCM catalyst; (c) contacting the combustion catalyst with the gas mixture feed to combust at least a portion of gas mixture feed and generate a heated gas mixture having a temperature of at least 450 °C; and (d) contacting the OCM catalyst with the heated gas mixture to initiate an OCM reaction and produce an OCM effluent comprising (i) C2+ compounds including ethylene and ethane, and (ii) non-C2+ impurities comprising one or more of CO, CH4, H2, and carbon dioxide (CO2).

[0023] A method according to paragraph [0022], wherein the oxidant stream further comprises steam.

[0024] A method according to paragraph [0022] or paragraph [0023], wherein the combustion catalyst comprises a metal, a metal oxide, or a mixed metal oxide comprising at least one of platinum, chromium, copper, palladium, cobalt, iron, manganese, gold, cerium, bismuth, indium, molybdenum, rhodium, ruthenium, germanium, gadolinium, antimony, thallium, tellurium, lead, zinc, or tin.

[0025] A method according to any one of paragraphs [0022] to [0024], wherein the gas mixture feed has a temperature of 15 °C to 250 °C at the inlet of the OCM reactor. [0026] A method according to any one of paragraphs [0022] to [0025], wherein the heated gas mixture has a temperature of 500 °C to 700 °C.

[0027] A method according to any one of paragraphs [0022] to [0026], wherein the OCM reactor further comprises at least one ignition source, wherein the at least one ignition source promotes ignition of components of the gas mixture feed.

[0028] A method according to paragraph [0027], wherein the at least one ignition source is in contact with the combustion catalyst and comprises at least one of an electrically powered cartridge heater or a steam heated pipe.

[0029] A method according to paragraph [0027], wherein the at least one ignition source is positioned upstream of both the combustion catalyst and the OCM catalyst and comprises an injection of superheated steam at a temperature of 600 °C to 1,000 °C.

[0030] A method according to any one of paragraphs [0022] to [0029], wherein the OCM reaction is performed at a temperature of 450 °C to 950 °C.

[0031] A method according to any one of paragraphs [0022] to [0030], wherein the OCM reaction has a selectivity for C2+ compounds of at least 35%.

[0032] A method according to any one of paragraphs [0022] to [0031], further comprising removing CO2 from the OCM effluent.

[0033] A method according to any one of paragraphs [0022] to [0032], further comprising separating the OCM effluent into at least (i) a first stream comprising CO, H2, and CH4 and (ii) a second stream comprising C2+ compounds including C2H4 and C2H6.

[0034] A method according to paragraph [0033], further comprising directing at least a portion of the first stream to the OCM reactor as part of the gas mixture feed.

[0035] A method according to paragraph [0033] or paragraph [0034], further comprising separating the second stream to produce a third stream comprising C2H4 and a fourth stream comprising C2H6.

[0036] A method according to paragraph [0035], further comprising directing the fourth stream to a post-bed cracking unit that is downstream of both the combustion catalyst and the OCM catalyst. [0037] A method according to any one of paragraphs [0022] to [0036], wherein the combustion catalyst preferentially combusts H2, CO, or both over CH4.

[0038] The present disclosure provides a system for performing an oxidative coupling of methane (OCM) reaction to produce C2+ compounds, the system comprising: an OCM reactor that includes a combustion catalyst and an OCM catalyst, wherein the OCM reactor receives a gas mixture feed comprising methane (CH4), oxygen (O2), hydrogen (H2), and carbon monoxide (CO) at a temperature of less than or equal to 300 °C, wherein the combustion catalyst promotes combustion of at least a portion of the gas mixture feed to generate a heated gas mixture having a temperature of at least 450 °C, and wherein the OCM catalyst initiates an OCM reaction when contacted by the heated gas mixture and produces an OCM effluent comprising (i) C2+ compounds including ethylene and ethane, and (ii) non-C2+ impurities comprising one or more of CO, CH4, H2, and carbon dioxide (CO2).

[0039] A system according to paragraph [0038], wherein the combustion catalyst comprises a metal, a metal oxide, or a mixed metal oxide comprising at least one of platinum, chromium, copper, palladium, cobalt, iron, manganese, gold, cerium, bismuth, indium, molybdenum, rhodium, ruthenium, germanium, gadolinium, antimony, thallium, tellurium, lead, zinc, or tin.

[0040] A system according to paragraph [0038] or paragraph [0039], wherein the OCM reactor further comprises at least one ignition source, wherein the at least one ignition source promotes ignition of components of the gas mixture feed.

[0041] A system according to paragraph [0040], wherein the at least one ignition source is in contact with the combustion catalyst and comprises at least one of an electrically powered cartridge heater or a steam heated pipe.

[0042] A system according to paragraph [0040], wherein the at least one ignition source is positioned upstream of both the combustion catalyst and the OCM catalyst and comprises a superheated steam injector that injects steam at a temperature of 600 °C to 1,000 °C into the OCM reactor.

[0043] A system according to any one of paragraphs [0038] to [0042], further comprising a separations subsystem downstream of and fluidly coupled to the OCM reactor, wherein the separations subsystem is configured to receive the OCM effluent and separate the OCM effluent into at least (i) a first stream comprising CO, H2, and CH4 and (ii) a second stream comprising C2+ compounds including C2H4 and C2H6.

[0044] A system according to any one of paragraphs [0038] to [0043], further comprising a CO2 removal unit fluidly coupled to the OCM reactor and the separations subsystem, wherein the CO2 removal unit is configured to remove CO2 from the OCM effluent and to direct the substantially CO2-free OCM effluent to the separations subsystem.

[0045] A system according to paragraph [0043] or paragraph [0044], wherein the separations subsystem comprises a demethanizer unit and a C2 purification unit; wherein the demethanizer unit is configured to: (i) receive the OCM effluent; (ii) separate the OCM effluent into the first stream and the second stream; (iii) direct at least a portion of the first stream to the OCM reactor; and (iv) direct the second stream to the C2 purification unit; and wherein the C2 purification unit is fluidly coupled to the OCM reactor and is configured to receive the second stream and to separate the second stream into at least a third stream comprising C2H4 and a fourth stream comprising C2H6.

[0046] A system according to paragraph [0045], wherein the OCM reactor further comprises a post-bed cracking (PBC) unit downstream of both the combustion catalyst and the OCM catalyst, and wherein the PBC unit is configured to receive the fourth stream and to generate C2H4.

[0047] A system according to any one of paragraphs [0038] to [0046], wherein the combustion catalyst preferentially combusts H2, CO, or both over CH4.

[0048] Other aspects and advantages of the present disclosure will be apparent from the description that follows.

BRIEF DESCRIPTION OF THE DRAWINGS

[0049] FIG. 1 illustrates a schematic of an exemplary oxidative coupling of methane reactor in accordance with the present disclosure;

[0050] FIG. 2 illustrates a schematic of an exemplary oxidative coupling of methane reactor in accordance with the present disclosure; [0051] FIG. 3 illustrates a schematic of an exemplary oxidative coupling of methane reactor in accordance with the present disclosure;

[0052] FIG. 4 illustrates a schematic of an exemplary oxidative coupling of methane reactor in accordance with the present disclosure;

[0053] FIG. 5 illustrates a block flow diagram of an exemplary system for performing an oxidative coupling of methane reaction to produce C2+ compounds in accordance with the present disclosure; and

[0054] FIG. 6 illustrates a block flow diagram of an exemplary system for performing an oxidative coupling of methane reaction to produce C2+ compounds in accordance with the present disclosure.

DETAILED DESCRIPTION

[0055] Described herein are methods and systems for performing an oxidative coupling of methane reaction to produce C2+ compounds using a low temperature gas mixture feed. In accordance with the invention of the present disclosure, an oxidative coupling of methane (OCM) reaction is performed utilizing a gas mixture feed having a temperature of less than or equal to 300 °C. The methods and systems of the present disclosure improve the overall safety of the OCM process by avoiding issues associated with mixing methane and oxygen at elevated temperatures (e.g., 450 °C or more). In addition, the methods and systems of the present disclosure obviate the need for a high temperature furnace or preheater typically used in conventional OCM processes, which thereby eliminates the associated furnace/preheater air emissions from the process. Furthermore, the methods and systems of the present disclosure can promote the C2+ selectivity of the OCM reaction by preferentially combusting hydrogen, carbon monoxide, or both over methane in the gas mixture feed.

[0056] The term “OCM reaction,” as used herein, generally refers to an oxidative coupling of methane reaction or process to produce ethylene (C2H4). An OCM reaction can include the oxidation of methane to a hydrocarbon and water and involves an exothermic reaction. In an OCM reaction, methane can be partially oxidized to one or more C2+ compounds, such as ethylene. In an example, an OCM reaction is 2 CH4 + O2 C2H4 + 2 H2O. An OCM reaction can yield C2+ compounds. An OCM reaction can be facilitated by an OCM catalyst, such as a heterogeneous catalyst. Additional by-products of OCM reactions can include CO, CO2, and H2. Ethane can also react to form ethylene over the OCM catalyst in an OCM reaction.

[0057] The terms “C2+” and “C2+ compound,” as used herein, generally refer to a compound comprising two or more carbon atoms, e.g., C2, C3, etc. C2+ compounds include, but are not limited to, alkanes, alkenes, and alkynes that contain two or more carbon atoms. Examples of C2+ compounds include ethane, ethylene, ethyne, propane, propylene, propyne, and so forth. Similarly, the terms “C3+” and “C3+ compound,” as used herein generally refer to a compound comprising three or more carbon atoms, e.g., C3, C4, C5, etc. C3+ compounds include, but are not limited to, alkanes, alkenes, and alkynes that contain two or more carbon atoms. Examples of C3+ compounds include propane, propylene, propyne, butane, butene, and so forth.

[0058] The term “non-C2+ impurities,” as used herein, generally refers to material that does not include C2+ compounds. Examples of non-C2+ impurities, which may be found in certain OCM reaction product streams or effluents include, but are not limited to, nitrogen (N2), oxygen (O2), water (H2O), argon (Ar), hydrogen (H2) carbon monoxide (CO), carbon dioxide (CO2), and methane (CEU).

[0059] The term “C2+ selectivity,” as used herein, generally refers to the percentage of the moles of carbon in methane that are converted into C2+ compounds (e.g., ethylene, ethane).

[0060] The term “unit,” as used herein, generally refers to a unit operation. A unit operation may be one or more basic operations in a process. A unit may have one or more sub-units (or subsystems). Unit operations may involve a physical change or chemical transformation, such as separation, crystallization, evaporation, filtration, polymerization, isomerization, other reactions, or combinations thereof. A unit may include one or more individual components. For example, a separations unit may include one or more separation columns, or an amine unit may include one or more amine columns.

[0061] As used herein the term “adiabatic” refers to a system experiencing minimal or ideally no interchange or exchange of thermal energy with the surrounding environment. As used herein “adiabatic” vessels (e.g., reactors) and vessels said to be operating under “adiabatic” conditions refer to vessels having no provision specifically for the removal or addition of thermal energy to or from the system. Notwithstanding the foregoing, it will be appreciated that incidental thermal transfer between the vessel and its environment is contemplated within the context of the foregoing definition. Generally, where an adiabatic vessel is used to contain a reaction that releases thermal energy (/.<?., an “exothermic” reaction), a positive temperature profile will be maintained between the reactants added to the vessel and the products removed from the vessel. In other words, the products removed from the vessel will generally be at a temperature above the temperature of the reactants introduced to the vessel since the thermal energy liberated by the reaction can only be substantially removed by the products of the reaction.

[0062] The term “substantially CCh-free,” as used herein, generally refers to a CO2 molar percentage of less than 1%, including less than 0.5%, less than 0.25%, less than 0.1%, less than 0.05%, and also including 0%.

[0063] The term “substantially dry,” as used herein, generally refers to a H2O molar percentage of less than 1%, including less than 0.5%, less than 0.25%, less than 0.1%, less than 0.05%, and also including 0%.

[0064] In accordance with the present invention, it has been discovered that an OCM reaction can be performed utilizing a gas mixture feed having a temperature of 300 °C or less by using a combustion catalyst to autothermally heat the gas mixture feed to a temperature sufficient to initiate an OCM reaction when the heated gas mixture contacts an OCM catalyst. The methods and systems of the present disclosure have several advantages over known OCM methods and systems including improved process safety by using a gas mixture feed containing methane and oxygen at a low temperature (i.e., 300 °C or less), less capital equipment and emissions (i.e., no high temperature furnace/preheater or associated emissions), and good C2+ selectivity of the OCM reaction.

[0065] Reference will now be made to the figures to further describe the methods and systems of the present disclosure. It will be appreciated that the figures and features therein are not necessarily drawn to scale. In the figures, the direction of fluid flow is indicated by arrows. Fluid may be directed from one unit to another with the aid of valves and a fluid flow system. As those of skill in the art will appreciate, such fluid flow systems may include compressors and/or pumps, as well as a control system for regulating fluid flow.

[0066] Referring now to FIG. 1, a system 100 for performing an OCM reaction to produce C2+ compounds, including ethylene (C2H4), in accordance with the present disclosure is shown. The system 100 includes an OCM reactor 10 comprising a combustion catalyst 12 and an OCM catalyst 14. In certain aspects, the system 100 can include one or more OCM reactors 10 in series and/or parallel. In certain aspects, the OCM reactor 10 is an adiabatic reactor. In certain aspects, the OCM reactor 10 operates under adiabatic conditions. In certain aspects, the OCM reactor 10 is an isothermal reactor. In certain aspects, the OCM reactor 10 operates under isothermal conditions. The OCM reactor 10 may operate at a pressure of 0 kPa (gauge) to 2,000 kPa (gauge), including a pressure of 100 kPa (gauge) to 2,000 kPa (gauge), a pressure of 250 kPa (gauge) to 2,000 kPa (gauge), a pressure of 500 kPa (gauge) to 2,000 kPa (gauge), a pressure of 700 kPa (gauge) to 1,500 kPa (gauge), and also including a pressure of 750 kPa (gauge) to 1,250 kPa (gauge).

[0067] As seen in FIG. 1, the OCM reactor 10 receives a gas mixture feed 20 at an inlet of the OCM reactor 10. The gas mixture feed 20 comprises methane (CPU), oxygen (O2), hydrogen (H2), and carbon monoxide (CO). The gas mixture feed 20 may be formed by mixing together a hydrocarbon stream 22 comprising CPU, H2, and CO and an oxidant stream 24 comprising O2. In certain aspects of the methods and systems of the present disclosure, the oxidant stream 24 is provided by an air stream or an O2 stream that is generated by an air separation unit. In certain aspects of the methods and systems of the present disclosure, the oxidant stream 24 further comprises steam, which may be injected or otherwise added into the oxidant stream 24 via line 26. In certain aspects, the hydrocarbon stream 22 is mixed with the oxidant stream 24 in a mixing device 30. The mixing device 30 may be any known device suitable for mixing together a first gas stream comprising hydrocarbons and a second gas stream comprising oxygen such as, for example, the mixing device described in U.S. Patent No. 3,706,534. In certain aspects, the mixing device 30 comprises process piping or a mixing tee.

[0068] In accordance with the methods and systems of the present disclosure, the gas mixture feed 20 is introduced in the OCM reactor 10 at a temperature of less than or equal to 300 °C. In certain aspects, the gas mixture feed 20 is introduced in the OCM reactor 10 at a pressure of 200 kPa (gauge) to 1,400 kPa (gauge), including a pressure of 500 kPa (gauge) to 1,200 kPa (gauge), 600 kPa (gauge) to 1,100 kPa (gauge), 700 kPa (gauge) to 1,000 kPa (gauge), and also including a pressure of 750 kPa (gauge) to 950 kPa (gauge). In certain aspects, the gas mixture feed 20 has a temperature of 15 °C to 300 °C at the inlet of the OCM reactor 10, including a temperature of 50 °C to 300 °C, 100 °C to 300 °C, 100 °C to 250 °C, 100 °C to 225 °C, 100 °C to 200 °C, 100 °C to 175 °C, 100 °C to 150 °C, 100 °C to 125 °C, 125 °C to 300 °C, 150 °C to 300 °C, 175 °C to 300 °C, 200 °C to 300 °C, 225 °C to 300 °C, 250 °C to 300 °C and also including a temperature of 275 °C to 300 °C at the inlet of the OCM reactor 10. In certain aspects, the hydrocarbon stream 22 used to form the gas mixture feed 20 has a temperature of less than or equal to 300 °C, including a temperature of 15 °C to 300 °C, 25 °C to 300 °C, 50 °C to 300 °C, 75 °C to 300 °C, 100 °C to 300 °C, 125 °C to 250 °C, 150 °C to 225 °C, 175 °C to 200 °C, 15 °C to 250 °C, 15 °C to 200 °C, 15 °C to 150 °C, 15 °C to 100 °C, 15 °C to 75 °C, and also including a temperature of 15 °C to 50 °C. In certain aspects, the oxidant stream 24 used to form the gas mixture feed 20 has a temperature of 0 °C to 250 °C, including a temperature of 10 °C to 250 °C, 20 °C to 250 °C, 30 °C to 200 °C, 30 °C to 150 °C, 30 °C to 100 °C, 30 °C to 50 °C, 40 °C to 250 °C, 100 °C to 250 °C, 150 °C to 250 °C, 200 °C to 250 °C, 0 °C to 50 °C, and also including a temperature of 0 °C to 30 °C.

[0069] By providing the gas mixture feed 20 to the OCM reactor 10 at a relatively low temperature, the methods and systems of the present disclosure improve the safety of the OCM process by essentially eliminating the chances of the gas mixture feed 20 prematurely igniting. While beneficial, the low temperature of the gas mixture feed 20 creates an obstacle to successfully performing an OCM reaction, namely, achieving the minimum temperature required to light-off or activate an OCM catalyst 14 to initiate an OCM reaction. Depending on the OCM catalyst 14, a minimum temperature of at least 450 °C (e.g., 450 °C to 700 °C) and more typically 500 °C to 700 °C is required to achieve light-off and initiate an OCM reaction.

[0070] Accordingly, to overcome this obstacle, the methods and systems of the present disclosure utilize a combustion catalyst 12 to autothermally heat the gas mixture feed 20 within the OCM reactor 10. When contacted by the gas mixture feed 20, the combustion catalyst 12 promotes combustion of at least a portion of the gas mixture feed 20 to generate a heated gas mixture having a temperature of at least 450 °C. In certain aspects of the methods and systems of the present disclosure, when contacted by the gas mixture feed 20, the combustion catalyst 12 promotes combustion of at least a portion of the gas mixture feed 20 to generate a heated gas mixture having a temperature of 450 °C to 700 °C, including a temperature of 500 °C to 700 °C, 500 °C to 650 °C, a temperature of 500 °C to 600 °C, and also including a temperature of 525 °C to 600 °C. Accordingly, the combustion catalyst 12 can be used to create a temperature difference between the temperature of the gas mixture feed 20 at the inlet of the OCM reactor 10 and the temperature of the heated gas mixture of 150 °C to 600 °C, including a temperature difference of 200 °C to 550 °C, 250 °C to 550 °C, 300 °C to 500 °C, and also including a temperature difference of 350 °C to 500 °C.

[0071] The combustion catalyst 12 can be any catalyst composition now known or known in the future that is capable of combusting at least a portion of one or more components of the gas mixture feed 20 (e.g., H2, CO, CH4). In certain aspects of the methods and systems of the present disclosure, the combustion catalyst 12 comprises at least one of a metal, a metal oxide, or a mixed metal oxide. Exemplary metals, metal oxides, and mixed metal oxides suitable for use as the combustion catalyst 12 of the present disclosure include, but are not limited to, platinum, platinum oxide, chromium, chromium(II) oxide, chromium(III) oxide, chromium (VI) oxide, copper, copper(I) oxide, copper(II) oxide, copper(III) oxide, palladium, palladium(II) oxide, cobalt, cobalt(II) oxide, cobalt(III) oxide, iron, iron(II) oxide, iron(III) oxide, manganese, manganese(II) oxide, manganese(III) oxide, gold, gold(III) oxide, cerium, cerium(IV) oxide, tin, tin(II) oxide, tin(IV) oxide, bismuth, bismuth(III) oxide, indium, indium(III) oxide, molybdenum, molybdenum(IV) oxide, molybdenum(VI) oxide, antimony, antimony(III) oxide, lanthanum, lanthanum(III) oxide, aluminum, silver, osmium, tungsten, lead, zinc, nickel, rhodium, ruthenium, thallium, tellurium, germanium, gadolinium, Bi2Mo3Oi2, I MruOu, AI2MO3O12, Fe2Mo3Oi2, Cr2Mo3Oi2, La2Mo3Oi2, Ce2Mo3Oi2, or combinations thereof. In certain aspects, the combustion catalyst 12 used in the methods and systems of the present disclosure may be in the form of loose catalyst, agglomerated catalyst, sintered catalyst, catalyst pressed or otherwise formed into various shapes such as rings, saddles, spoked wheels, snowflakes, and the like that provide a high ratio of exposed surface area to volume. In certain aspects, the combustion catalyst 12 used in the methods and systems of the present disclosure may be affixed, bonded, or otherwise attached to a substrate or support, which may or may not be inert, that provides structural strength and/or form to the catalyst. Exemplary substrates or supports to which the combustion catalyst 12 may be affixed, bonded, or otherwise attached include, but are not limited to, silica, alumina, titania, zirconia, ceria, hafinia, cordierite, silicon carbide, aluminum hydroxide, calcium aluminates (e.g., tricalcium aluminate, monocalcium aluminate), and zeolites (e.g., ZSM-5 zeolite, Y zeolite, MCM-41 zeolite).

[0072] In certain aspects of the methods and systems of the present disclosure, the combustion catalyst 12 selectively or preferentially combusts H2, CO, or both over CEU. Such a combustion catalyst 12 is referred to hereinafter as a “selective combustion catalyst.” The selective combustion catalyst can comprise any one or combination of the metals, metal oxides, or mixed metal oxides described above that selectively or preferentially combust H2, CO, or both over CH4. In certain aspects of the methods and systems of the present disclosure, the selective combustion catalyst comprises at least one of platinum, palladium, gold, bismuth, tin, platinum-gold, platinum-tin, palladium(II) oxide, ruthenium, bismuth(III) oxide, antimony(III) oxide, indium(III) oxide, molybdenum(VI) oxide, Bi2Mo3Oi2, I MosOu, AI2MO3O12, Fe2Mo3Oi2, CnMruOu, La2Mo3Oi2, Ce2Mo3Oi2, or combinations thereof. In certain aspects, the selective combustion catalyst may be in the form of loose catalyst, agglomerated catalyst, sintered catalyst, catalyst pressed or otherwise formed into various shapes such as rings, saddles, spoked wheels, snowflakes, and the like that provide a high ratio of exposed surface area to volume. In certain aspects, the selective combustion catalyst may be affixed, bonded, or otherwise attached to a substrate or support, which may or may not be inert, that provides structural strength and/or form to the catalyst. Exemplary substrates or supports to which the selective combustion catalyst may be affixed, bonded, or otherwise attached include, but are not limited to, silica, alumina, titania, zirconia, ceria, hafinia, cordierite, silicon carbide, aluminum hydroxide, calcium aluminates e.g., tricalcium aluminate, monocalcium aluminate), and zeolites (e.g., ZSM-5 zeolite, Y zeolite, MCM-41 zeolite).

[0073] By using a selective combustion catalyst, less CEU in the gas mixture feed 20 is consumed or combusted when autothermally raising the temperature of the gas mixture feed 20, which results in more CEU being available to participate in the OCM reaction. As a result, the selectivity of the OCM reaction for converting CEU to C2+ compounds (i.e., C2+ selectivity) can be maintained or improved.

[0074] In certain aspects of the methods and systems of the present disclosure, the OCM reaction has a C2+ selectivity of at least 35%, at least 40%, at least 45%, at least 50%, at least 55%, at least 60%, at least 65%, or at least 70%. In certain aspects of the methods and systems of the present disclosure, the OCM reaction has a C2+ selectivity of 35% to 85%, including a C2+ selectivity of 40% to 85%, 50% to 85%, 60% to 85%, and also including a C2+ selectivity of 70% to 85%.

[0075] In addition to the combustion catalyst 12, the OCM reactor 10 also includes an OCM catalyst 14 to facilitate an OCM reaction to produce an OCM effluent 40 comprising C2+ compounds including C2H4 and C2H6 and non-C2+ impurities comprising one or more of CO, CH4, H2, and carbon dioxide (CO2). The OCM catalyst 14 may be any catalyst composition now known or known in the future that facilitates an OCM reaction, such as the catalysts described in, for example, U.S. Patent No. 8,921,256, U.S. Patent No. 8,962,517, and U.S. Patent No. 9,718,054, the full disclosures of which are incorporated herein by reference in their entirety. In certain aspects, the OCM catalyst 14 used in the methods and systems of the present disclosure may be in the form of loose catalyst, agglomerated catalyst, sintered catalyst, catalyst pressed or otherwise formed into various shapes such as rings, saddles, spoked wheels, snowflakes, and the like that provide a high ratio of exposed surface area to volume. In certain aspects, the OCM catalyst 14 used in the methods and systems of the present disclosure may be affixed, bonded, or otherwise attached to a substrate or support, which may or may not be inert, that provides structural strength and/or form to the catalyst.

[0076] When contacted by the heated gas mixture, the OCM catalyst 14 becomes activated (i.e., achieves light-off) and initiates an OCM reaction to produce the OCM effluent 40 comprising C2+ compounds including C2H4 and C2H6 and non-C2+ impurities comprising one or more of CO, CH4, H2, and CO2. Because the OCM reaction is exothermic, the temperature at which the OCM reaction is performed and/or maintained is typically higher than the temperature of the heated gas mixture used to activate or light-off the OCM catalyst 14. In certain aspects, the OCM reaction is performed and/or maintained at a temperature of 450 °C to 950 °C, including a temperature of 500 °C to 950 °C, 550 °C to 950 °C, 600 °C to 950 °C, 650 °C to 950 °C, 700 °C to 950 °C, 750 °C to 950 °C, 800 °C to 950 °C, 850 °C to 950 °C, and also including a temperature of 875 °C to 925 °C. The OCM effluent 40 exiting the OCM reactor 10 will generally have a temperature corresponding to that of the OCM reaction temperature (i.e., 450 °C to 950 °C) and can be directed to downstream units and/or a separations subsystem for additional processing as described herein.

[0077] The combustion catalyst 12 and the OCM catalyst 14 can be arranged within the OCM reactor 10 in a variety of ways. For example, in certain aspects, the OCM reactor 10 can include a first catalyst bed containing the combustion catalyst 12 and a second catalyst bed containing the OCM catalyst 14 downstream of the first catalyst bed, as illustrated in FIG. 1. In certain aspects, the OCM reactor 10 can include a single catalyst bed comprising at least one layer of the combustion catalyst 12 and at least one layer of the OCM catalyst 14. In certain aspects, the OCM reactor 10 can include a single catalyst bed that comprises a mixture of the combustion catalyst 12 and the OCM catalyst 14. The OCM reactor 10 can also include one or more layers or beds of inert material (not shown), which may function as a physical support for the catalysts 12, 14 in a catalyst bed. In certain aspects, the OCM reactor 10 can include a first catalyst bed containing the combustion catalyst 12 and an inert material, either as one or more distinct layers or as a mixture, and a second catalyst bed containing the OCM catalyst 14.

[0078] With continued reference to FIG. 1, the OCM reactor 10 may comprise one or more temperature elements 50 to provide an indication of temperature within the OCM reactor 10. The temperature element 50 may be any suitable temperature measuring device including, but not limited to, a thermocouple and a resistance temperature detector (RTD). As seen in FIG. 1, a temperature element 50 is located in the combustion catalyst 12 upstream of the OCM catalyst 14. For example, where the OCM reactor 10 includes a first catalyst bed comprising a combustion catalyst 12 and a second catalyst bed comprising an OCM catalyst 14, the temperature element 50 is located proximate an end of the first catalyst bed and upstream of the second catalyst bed. In another example, where the OCM reactor 10 includes a single catalyst bed comprising a layer of combustion catalyst 12 upstream of a layer of OCM catalyst, the temperature element 50 is located in the layer of combustion catalyst 12 proximate an interface between the layer of combustion catalyst 12 and the layer of OCM catalyst 14. The temperature element 50 can be used to provide one or more signals indicative of a temperature of the heated gas mixture prior to the heated gas mixture contacting the OCM catalyst 14. The temperature element 50 can be part of a control system operative to maintain the temperature of the heated gas mixture at a desired setpoint (e.g., the minimum OCM catalyst light-off temperature) by, for example, controlling or otherwise adjusting a temperature of the hydrocarbon stream 22, the oxidant stream 24, or both.

[0079] In certain aspects, the methods and systems of the present disclosure include a postbed cracking (PBC) unit 60 for generating olefins (e.g., C2H4) from alkanes (e.g., C2H6, CsHs). The PBC unit 60 can be disposed downstream of the OCM reactor 10, as illustrated in FIG. 1. The PBC unit 60 may be a separate reactor, or the PBC unit 60 may be included as a section of the OCM reactor 10 (e.g., a section downstream of the OCM catalyst 14 in the same vessel). As the OCM reaction is exothermic and generates heat, the heat generated by the OCM reaction can be used to crack alkanes (e.g., C2H6) to olefins (e.g., C2H4). The PBC unit 60 may perform the cracking at a temperature of 600 °C to 1,000 °C, including a temperature of 700 °C to 1,000 °C, 750 °C to 1,000 °C, 775 °C to 1,000 °C, and also including a temperature of 800 °C to 950 °C.

[0080] The PBC unit 60 can be used to crack additional external alkanes 65 (e.g., C2H6, CsHs) beyond those contained in the OCM effluent 40. The heat capacity in the OCM effluent 40 can be sufficient to crack some amount of additional external alkanes 65. The additional external alkanes 65 can be provided from a recycle stream of the process or an entirely separate source of alkanes. The external alkanes 65 can be heated prior to injection into the PBC unit 60. The external alkanes 65 can be heated by, for example, heat exchange with the OCM reactor 10 and/or the OCM effluent 40, or another process stream. A PBC effluent 70 exits the PBC unit 60 and includes a greater concentration of olefins (e.g., C2H4) and H2 as compared to the OCM effluent 40.

[0081] In certain aspects, the methods and systems of the present disclosure include injecting an ignition component 80 into the OCM reactor 10. The ignition component 80 can be any substance that has a lower autoignition temperature than CPU such as, for example, dimethyl ether or methanol. The ignition component 80 can be provided to the OCM reactor 10 as an additional means (i.e., via combustion of the ignition component 80) to increase the temperature of the gas mixture feed 20. Although FIG. 1 illustrates the ignition component 80 being injected directly into the OCM reactor 10, the ignition component 80 could also be added to one or more of the gas mixture feed 20, the hydrocarbon stream 22, or the oxidant stream 24.

[0082] Referring now to FIG. 2, a system 200 for performing an OCM reaction to produce C2+ compounds, including ethylene (C2H4), in accordance with the present disclosure is shown. The system 200 illustrated in FIG. 2 is similar to the system 100 depicted in FIG. 1 and like numerals are used in FIG. 2 to identify like components. The primary difference between the system 200 illustrated in FIG. 2 and the system 100 illustrated in FIG. 1 is that the OCM reactor 10 of system 200 comprises at least one ignition source 16.

[0083] The at least one ignition source 16 promotes ignition of components (e.g., H2, CO, or both) of the gas mixture feed 20. As seen in FIG. 2, the at least one ignition source 16 is in contact with the combustion catalyst 12 and can provide a localized ignition to assist operation of the combustion catalyst 12 in generating the heated gas mixture. In certain aspects, the at least one ignition source 16 comprises at least one of a steam heated pipe, an electrically powered cartridge heater or other electronic igniter. The ignition source 16 can operate to provide a sufficient temperature (e.g., 400 °C to 600 °C) to cause ignition of one or more components of the gas mixture feed 20 in a localized area of the combustion catalyst 12 as a mechanism for assisting the combustion catalyst 12 in promoting combustion of at least a portion of gas mixture feed 20 to generate the heated gas mixture. In certain aspects, the at least one ignition source 16 (e.g., steam heated pipe, electrically powered cartridge heater or other electronic igniter) can be positioned proximate to and upstream of the combustion catalyst 12 (/.<?., not in direct contact with the combustion catalyst 12) to provide a localized ignition to assist operation of the combustion catalyst 12 in generating the heated gas mixture.

[0084] In the system 200 illustrated in FIG. 2, the OCM reactor 10 may include a temperature element 50 located in the combustion catalyst 12 upstream of the OCM catalyst 14 as described above with respect to the system 100 shown in FIG. 1. In the system 200, the temperature element 50 can be part of a control system operative to maintain the temperature of the heated gas mixture at a desired setpoint (e.g., the minimum OCM catalyst light-off temperature) by, for example, controlling or otherwise adjusting a temperature locally imparted by the at least one ignition source 16 (e.g., by adjusting an amount of power provided to the one or more electrically powered cartridge heaters, by adjusting a temperature of the one or more steam heated pipes). In certain aspects, in addition to controlling or otherwise adjusting the temperature imparted by the at least one ignition source 16, a temperature of the hydrocarbon stream 22, the oxidant stream 24, or both may be controlled or otherwise adjusted to maintain the temperature of the heated gas mixture at the desired setpoint.

[0085] Referring now to FIG. 3, a system 300 for performing an OCM reaction to produce C2+ compounds, including ethylene (C2H4), in accordance with the present disclosure is shown. The system 300 illustrated in FIG. 3 is similar to the systems 100, 200 depicted in FIGS. 1 and 2 and like numerals are used in FIG. 3 to identify like components. The primary difference between the system 300 illustrated in FIG. 3 and the system 200 illustrated in FIG. 2 resides in the type and configuration of the least one ignition source 16.

[0086] As seen in FIG. 3, the at least one ignition source 16 is positioned upstream of both the combustion catalyst 12 and the OCM catalyst 14. In the system 300 illustrated in FIG. 3, the at least one ignition source 16 comprises a superheated steam injector that injects superheated steam at a temperature of 600 °C to 1,000 °C into the OCM reactor 10. In certain aspects, the superheated steam has a pressure of 400 kPa (gauge) to 3,000 kPa (gauge). In certain aspects of the methods and systems of the present disclosure, superheated steam is injected into the OCM reactor 10 at a temperature of 625 °C to 1,000 °C, including a temperature of 650 °C to 950 °C, a temperature of 675 °C to 900 °C, 700 °C to 900 °C, and also including a temperature of 750 °C to 850 °C. The injection of superheated steam can cause ignition of one or more components of the gas mixture feed 20 to assist operation of the combustion catalyst 12 in generating the heated gas mixture. In addition, because the system 300 includes the injection of superheated steam into the OCM reactor 10, the optional steam 26 added to the oxidant stream 24 illustrated in FIGS. 1 and 2 is unnecessary.

[0087] In the system 300 illustrated in FIG. 3, the OCM reactor 10 may include a temperature element 50 located in the combustion catalyst 12 upstream of the OCM catalyst 14 as described above with respect to system 100, 200 shown in FIGS. 1 and 2. In the system 300, the temperature element 50 can be part of a control system operative to maintain the temperature of the heated gas mixture at a desired setpoint (e.g., the minimum OCM catalyst light-off temperature) by, for example, controlling or otherwise adjusting a temperature the superheated steam injected into the OCM reactor 10. In certain aspects, in addition to controlling or otherwise adjusting the temperature of the superheated stem injected into the OCM reactor 10, a temperature of the hydrocarbon stream 22, the oxidant stream 24, or both may be controlled or otherwise adjusted to maintain the temperature of the heated gas mixture at the desired setpoint.

[0088] Referring now to FIG. 4, a system 400 for performing an OCM reaction to produce C2+ compounds, including ethylene (C2H4), in accordance with the present disclosure is shown. The system 400 illustrated in FIG. 4 is similar to the systems 100, 200, 300 depicted in FIGS. 1-3 and like numerals are used in FIG. 4 to identify like components.

[0089] As seen in FIG. 4, the OCM reactor 10 includes a single catalyst bed 18 that comprises a combustion catalyst 12 and an OCM catalyst 14 as well as at least one ignition source 16 located in the catalyst bed 18. The catalyst bed 18 can be configured such that the at least one ignition source 16 (e.g., steam heated pipe, electrically powered cartridge heater or other electronic igniter) is encompassed by the combustion catalyst 12. Alternatively, the at least one ignition source 16 (e.g., steam heated pipe, electrically powered cartridge heater or other electronic igniter) can be positioned proximate to and upstream of the catalyst bed 18 (/.<?., not in direct contact with the catalyst bed 18). In certain aspects, the catalyst bed 18 can comprise at least one layer of the combustion catalyst 12 and at least one layer of the OCM catalyst 14. In certain aspects, the catalyst bed 18 can comprise a mixture of the combustion catalyst 12 and the OCM catalyst 14.

[0090] In the system 400 illustrated in FIG. 4, the OCM reactor 10 may include a temperature element 50 located in the catalyst bed 18. The temperature element 50 can be part of a control system operative to maintain a desired temperature profile across and/or throughout the catalyst bed 18 by, for example, controlling or otherwise adjusting a temperature locally imparted by the at least one ignition source 16 (e.g., by adjusting an amount of power provided to one or more electrically powered cartridge heaters, by adjusting a temperature of one or more steam heated pipes). In certain aspects, in addition to controlling or otherwise adjusting the temperature locally imparted by the at least one ignition source 16, a temperature of the hydrocarbon stream 22, the oxidant stream 24, or both may be controlled or otherwise adjusted to maintain the desired temperature profile across and/or throughout the catalyst bed 18.

[0091] Referring now to FIG. 5, a block flow diagram of a system 500 for performing an OCM reaction to produce C2+ compounds, including ethylene (C2H4), in accordance with the present disclosure is shown. The system 500 comprises an OCM subsystem 501, an optional CO2 removal unit 502, and a separations subsystem 503. The OCM subsystem 501 is fluidly coupled to the separations subsystem 503 and is configured to receive a gas mixture feed 510 having a temperature of less than or equal to 300 °C and comprising methane (CH4), oxygen (O2), hydrogen (H2), and carbon monoxide (CO) and to generate an OCM effluent 511 comprising C2+ compounds including C2H4 and C2H6 and non-C2+ impurities comprising one or more of CO, CO2, H2, and CH4. The separations subsystem 503 is downstream of and fluidly coupled to the OCM subsystem 501 and is configured to receive the OCM effluent 511 and to separate the OCM effluent 511 into at least a first stream 513 comprising CO, H2, and CH4 and a second stream (not shown) comprising C2+ compounds including C2H4 and C2H6. The second stream may be further separated in the separations subsystem 503 to produce a third stream 514 comprising C2H4 and a fourth stream 515 comprising C2H6.

[0092] In accordance with the methods and systems of the present disclosure, the OCM subsystem 501 includes an OCM reactor comprising a combustion catalyst and an OCM catalyst. In certain aspects, the OCM subsystem 501 includes an OCM reactor comprising a combustion catalyst and an OCM catalyst and a PBC unit. The OCM reactor and PBC unit of the OCM subsystem 501 may be configured the same as any one or more of the OCM reactors 10 and PBC units 60 previously described herein with reference to FIGS. 1-4.

[0093] As seen in FIG. 5, the gas mixture feed 510 is directed to the OCM subsystem 501 to generate an OCM effluent 511 comprising C2+ compounds including C2H4 and C2H6 and non-C2+ impurities comprising one or more of CO, CO2, H2, and CPU. The OCM effluent 511 can be directed to a separations subsystem 503 to separate the OCM effluent 511 into at least a first stream 513 comprising CO, H2, and CPU and a second stream comprising C2+ compounds including C2H4 and C2H6. As seen in FIG. 5, the first stream 513 comprising CO, H2, and CH4, or a portion thereof, can be recycled to the OCM subsystem 501 to facilitate generation of the gas mixture feed 510. In accordance with certain aspects of the methods and systems of the present disclosure, at least a portion of the first stream 513 may be purged via stream 516 to prevent the accumulation of inert components (e.g., N2) in the system 500. In addition, the separations subsystem 503 can separate the second stream comprising C2+ compounds into a third stream 514 comprising C2H4 product and a fourth stream 515 comprising C2H6. As shown in FIG. 5, the fourth stream 515 comprising C2H6 can be directed to the OCM subsystem 501 e.g., to the OCM reactor and/or to the PBC unit) to produce additional C2H4 and H2 by cracking the C2H6.

[0094] The separations subsystem 503 may comprise any number of separation units or utilize any combination of separation technologies suitable for separating the products of an OCM reaction. For example, the separations subsystem 503 may separate the OCM effluent 511 with the aid of cryogenic separation, pressure swing adsorption, temperature swing adsorption, membrane separation, adsorbents, and combinations thereof. Examples of separations subsystems 503 suitable for implementation in the methods and systems of the present disclosure are described in, for example, WO 2014/011646 Al, WO 2013/106771 A2, WO 2015/106023 Al, WO 2017/065947 Al, and WO 2018/118105 Al, the full disclosures of which are incorporated herein by reference in their entirety.

[0095] As seen in FIG. 5, in accordance with some aspects of the methods and systems of the present disclosure, the system 500 comprises a CO2 removal unit 502 fluidly coupled to the OCM subsystem 501 and the separations subsystem 503. The CO2 removal unit 502 is configured to remove CO2 from the OCM effluent 511 via stream 512 and to direct the substantially CO2-free OCM effluent to the separations subsystem 503. The CO2 removal unit 502 may comprise any known technology suitable for removing CO2 from a process stream. Examples of suitable CO2 removal technologies include, but are not limited to, an amine absorber system, pressure swing adsorption, temperature swing adsorption, membrane separation, solvent separation, and cryogenic separation.

[0096] While FIG. 5 illustrates a CO2 removal unit 502 positioned downstream of the OCM subsystem 501 and upstream of the separations subsystem 503, it is contemplated that CO2 contained in the OCM effluent 501 may be removed via the separations subsystem 503, thereby eliminating the need for a CO2 removal unit 502. Such an arrangement would be particularly suitable in systems where the separations subsystem 503 is based on adsorption technology.

[0097] In accordance with certain aspects of the methods and systems of the present disclosure, the system 500 comprises a mixing device 504 fluidly coupled to the OCM subsystem 501 and to the separations subsystem 503, as shown in FIG. 5. The mixing device 504 facilitates formation of the gas mixture feed 510 that is directed to the OCM subsystem 501. As seen in FIG. 5, the mixing device 504 receives a hydrocarbon stream that comprises at least a portion of the first stream 513 from the separations subsystem 503 and an oxidant stream 518 comprising oxygen. In certain aspects of the methods and systems of the present disclosure, a methane or natural gas stream 517 can be added to the first stream 513 to form the hydrocarbon stream that is directed to the mixing device 504. In certain aspects of the methods and systems of the present disclosure, the oxidant stream 518 is provided by an air stream or an O2 stream that is generated by, for example, an air separation unit, a membrane, or a water electrolysis unit. In certain aspects of the methods and systems of the present disclosure, the oxidant stream 518 further comprises steam, which may be injected or otherwise added into the oxidant stream 518 via line 519. The mixing device 504 may be any known device suitable for mixing together a first gas stream comprising hydrocarbons and a second gas stream comprising oxygen such as, for example, the mixing device described in U.S. Patent No. 3,706,534. In certain aspects, the mixing device 504 comprises process piping or a mixing tee.

[0098] The gas mixture feed 510 has a temperature of less than or equal to 300 °C when exiting the mixing device 504 and entering an inlet of an OCM reactor of the OCM subsystem 501. In certain aspects, the gas mixture feed 510 has a temperature of 15 °C to 300 °C at an inlet of the OCM reactor 10, including a temperature of 50 °C to 300 °C, 100 °C to 300 °C, 100 °C to 250 °C, 100 °C to 225 °C, 100 °C to 200 °C, 100 °C to 175 °C, 100 °C to 150 °C, 100 °C to 125 °C, 125 °C to 300 °C, 150 °C to 300 °C, 175 °C to 300 °C, 200 °C to 300 °C, 225 °C to 300 °C, 250 °C to 300 °C and also including a temperature of 275 °C to 300 °C at the inlet of the OCM reactor 10. In certain aspects, the hydrocarbon stream directed to the mixing device 504 has a temperature of less than or equal to 300 °C, including a temperature of 15 °C to 300 °C, 25 °C to 300 °C, 50 °C to 300 °C, 75 °C to 300 °C, 100 °C to 300 °C, 125 °C to 250 °C, 150 °C to 225 °C, 175 °C to 200 °C, 15 °C to 250 °C, 15 °C to 200 °C, 15 °C to 150 °C, 15 °C to 100 °C, 15 °C to 75 °C, and also including a temperature of 15 °C to 50 °C. In certain aspects, the oxidant stream 518 directed to the mixing device 504 has a temperature of 0 °C to 250 °C, including a temperature of 10 °C to 250 °C, 20 °C to 250 °C, 30 °C to 200 °C, 30 °C to 150 °C, 30 °C to 100 °C, 30 °C to 50 °C, 40 °C to 250 °C, 100 °C to 250 °C, 150 °C to 250 °C, 200 °C to 250 °C, and also including a temperature of 0 °C to 50 °C.

[0099] The first stream 513 from the separations subsystem 503, which comprises CO and H2 (z.e., byproducts of the OCM reaction) as well as CH4, can provide the reactants (other than O2) in the gas mixture feed 510 that contact the combustion catalyst and react/combust to generate a heated gas mixture having a temperature of at least 450 °C, which heated gas mixture then contacts the OCM catalyst to initiate an OCM reaction and produce the OCM effluent 511. Accordingly, at least a portion of the H2 and CO byproducts generated in the OCM reaction can be recycled to an OCM reactor of the OCM subsystem 501 as reactants that contact the combustion catalyst to autothermally heat the gas mixture feed 510 within the OCM reactor and thereby generate the heated gas mixture that contacts the OCM catalyst to initiate the OCM reaction and produce the C2+ compounds.

[00100] Although not shown in FIG. 5, it is contemplated that an ignition component, as previously described, could be injected into an OCM reactor of the OCM subsystem 501. Furthermore, it is contemplated that a stream comprising H2, CO, or both (e.g., syngas) could be added to the hydrocarbon stream that is directed to the mixing device 504 to form the gas mixture feed 510.

[00101] Referring now to FIG. 6, a block flow diagram of another implementation of a system 600 for performing an OCM reaction to produce C2+ compounds, including ethylene (C2H4), in accordance with the present disclosure is shown. Similar to the system 500 illustrated in FIG. 5, the system 600 comprises an OCM subsystem 601 and a separations subsystem (not numbered). In addition, the system 600 includes a methanation subsystem 605. The OCM subsystem 601 is fluidly coupled to the separations subsystem and to the methanation system 605 and is configured to receive a gas mixture feed 610 having a temperature of less than or equal to 300 °C that comprises methane (CPU), oxygen (O2), hydrogen (H2), and carbon monoxide (CO) and to generate an OCM effluent 611 comprising C2+ compounds including C2H4 and C2H6 and non-C2+ impurities comprising one or more of CO, CO2, H ₂ , and CH ₄ .

[00102] In accordance with the methods and systems of the present disclosure, the OCM subsystem 601 includes an OCM reactor comprising a combustion catalyst and an OCM catalyst. In certain aspects, the OCM subsystem 601 includes an OCM reactor comprising a combustion catalyst and an OCM catalyst and a PBC unit. The OCM reactor and PBC unit of the OCM subsystem 601 may be configured the same as any one or more of the OCM reactors 10 and PBC units 60 previously described herein with reference to FIGS. 1-4.

[00103] As seen in FIG. 6, the gas mixture feed 610 is directed to the OCM subsystem 601 to generate an OCM effluent 611 comprising C2+ compounds including C2H4 and C2H6 and non-C2+ impurities comprising one or more of CO, CO2, H2, and CPU. The OCM effluent 611 may be directed to one or more heat exchangers 602 to transfer heat from the OCM effluent

611 to a process stream and thereby cool the OCM effluent 611. In some aspects, the one or more heat exchangers may be a heat recovery steam generator (HRSG) that generates steam that may be used for heating, to generate power via a gas turbine, or for other processes.

[00104] With continued reference to FIG. 6, after passing through the one or more heat exchangers 602, the OCM effluent 611 may be directed to a process gas compressor 603 to increase the pressure of the OCM effluent 611 to a desired or suitable pressure such as at least 600 kPa (gauge), at least 800 kPa (gauge), at least 1,000 kPa (gauge), at least 1,200 kPa (gauge), at least 1,500 kPa (gauge), at least 1,750 kPa (gauge), or at least 2,000 kPa (gauge). In certain aspects of the methods and systems of the present disclosure, a natural gas stream

612 may be added to the OCM effluent 611 prior to entering the process gas compressor 603. The compressed OCM effluent 611 may be directed to a CO2 removal unit 604 to remove CO2 from the OCM effluent 611. At least a portion of the removed CO2 may be directed to the methanation subsystem 605 via stream 613. In accordance with some aspects of the methods and systems of the present disclosure, all of the CO2 removed by the CO2 removal unit 604 is directed to the methanation subsystem 605 via stream 613. The CO2 removal unit 604 may be configured the same as the CO2 removal unit 502 described above. The substantially CCh-free OCM effluent 611 may be directed to a process gas dryer 606 to remove H2O from the substantially CCh-free OCM effluent 611. The process gas dryer 606 may be one or more molecular sieve dryers or separator vessels that remove H2O (either as a vapor or a liquid) from the substantially CO2-free OCM effluent 611.

[00105] While FIG. 6 illustrates a CO2 removal unit 604 positioned downstream of the OCM subsystem 601 and upstream of the separations subsystem, it is contemplated that CO2 contained in the OCM effluent 611 may be removed via the separations subsystem, thereby eliminating the need for the CO2 removal unit 604. Such an arrangement would be particularly suitable in systems where the separations subsystem is based on adsorption technology.

[00106] Still referring to FIG. 6, after exiting the process gas dryer 606, the substantially dry, substantially CO2-free OCM effluent 611 may be directed to a separations subsystem that is downstream of and fluidly coupled to the OCM subsystem 601 and that comprises at least a demethanizer unit 607 and a C2 purification unit 608. The demethanizer unit 607 is fluidly coupled to the methanation system 605 and to the C2 purification unit 608, as illustrated in FIG. 6. The demethanizer unit 607 is configured to receive the OCM effluent 611, to separate the OCM effluent into a first stream 614 comprising CO, H2, and CH4 and a second stream 615 comprising C2+ compounds including C2H4 and C2H6. At least a portion of the first stream 614 is recycled to the OCM subsystem 601 to facilitate generation of the gas mixture feed 510. In accordance with some aspects of the methods and systems of the present disclosure, at least a portion of the first stream 614 is directed from the demethanizer unit 607 to the methanation subsystem 605 to generate a methanation effluent 617 comprising CH4. In accordance with some aspects of the methods and systems of the present disclosure, at least a portion of the first stream 614 is purged via line 616 to prevent the accumulation of inert components (e.g., N2) in the system 600.

[00107] The methanation subsystem 605 can include one or more methanation reactors that contain a methanation catalyst (e.g., a nickel -based catalyst, a ruthenium -based catalyst) for carrying out a methanation reaction to produce CH4. The typical operating conditions of a methanation reactor can be at a pressure of 100 kPa to 5,000 kPa and a temperature of 150 °C to 400 °C. In the methanation subsystem 605, the carbon oxides (e.g., CO2, CO, or both) from streams 613 and 614 react with H2 (e.g., H2 contained in stream 614) to produce a methanation effluent 617 comprising CH4 via the following reactions: i) CO2 + 4 H2 — CH4 + 2 H ₂ O and ii) CO + 3 H ₂ CH ₄ + H ₂ O.

[00108] In accordance with certain aspects of the methods and systems of the present disclosure, the system 600 comprises a mixing device 609 fluidly coupled to the OCM subsystem 601, the separations subsystem (e.g., via demethanizer unit 607), and the methanation subsystem 605, as shown in FIG. 6. The mixing device 609 facilitates formation of the gas mixture feed 610 that is directed to the OCM subsystem 601. As seen in FIG. 6, the mixing device 609 receives an oxidant stream 518 comprising oxygen and a hydrocarbon stream that comprises at least a portion of the first stream 614 from the demethanizer unit 607 and the methanation effluent 617. In certain aspects of the methods and systems of the present disclosure, an optional methane or natural gas stream 619 can be added to the first stream 614 along with the methanation effluent 617 to form the hydrocarbon stream that is directed to the mixing device 609. In certain aspects of the methods and systems of the present disclosure, the oxidant stream 618 is provided by an air stream or an O2 stream that is generated by an air separation unit. In certain aspects of the methods and systems of the present disclosure, the oxidant stream 618 further comprises steam, which may be injected or otherwise added into the oxidant stream 618 via line 620. The mixing device 609 may be any known device suitable for mixing together a first gas stream comprising hydrocarbons and a second gas stream comprising oxygen such as, for example, the mixing device described in U.S. Patent No. 3,706,534. In certain aspects, the mixing device 609 comprises process piping or a mixing tee.

[00109] The gas mixture feed 610 has a temperature of less than or equal to 300 °C when exiting the mixing device 609 and entering an inlet of an OCM reactor of the OCM subsystem 601. In certain aspects, the gas mixture feed 610 has a temperature of 15 °C to 300 °C at an inlet of the OCM reactor 10, including a temperature of 50 °C to 300 °C, 100 °C to

300 °C, 100 °C to 250 °C, 100 °C to 225 °C, 100 °C to 200 °C, 100 °C to 175 °C, 100 °C to

150 °C, 100 °C to 125 °C, 125 °C to 300 °C, 150 °C to 300 °C, 175 °C to 300 °C, 200 °C to

300 °C, 225 °C to 300 °C, 250 °C to 300 °C and also including a temperature of 275 °C to

300 °C at the inlet of the OCM reactor 10. In certain aspects, the hydrocarbon stream directed to the mixing device 609 has a temperature of less than or equal to 300 °C, including a temperature of 15 °C to 300 °C, 25 °C to 300 °C, 50 °C to 300 °C, 75 °C to 300 °C, 100 °C to 300 °C, 125 °C to 250 °C, 150 °C to 225 °C, 175 °C to 200 °C, 15 °C to 250 °C, 15 °C to 200 °C, 15 °C to 150 °C, 15 °C to 100 °C, 15 °C to 75 °C, and also including a temperature of 15 °C to 50 °C. In certain aspects, the oxidant stream 618 directed to the mixing device 609 has a temperature of 0 °C to 250 °C, including a temperature of 10 °C to 250 °C, 20 °C to 250 °C, 30 °C to 200 °C, 30 °C to 150 °C, 30 °C to 100 °C, 30 °C to 50 °C, 40 °C to 250 °C, 100 °C to 250 °C, 150 °C to 250 °C, 200 °C to 250 °C, and also including a temperature of 0 °C to 50 °C.

[00110] The first stream 614 from the demethanizer unit 607, which comprises CO and H2 (i.e., byproducts of the OCM reaction) as well as CH4, can provide the reactants (other than O2) in the gas mixture feed 610 that contact the combustion catalyst and react/combust to generate a heated gas mixture having a temperature of at least 450 °C, which heated gas mixture then contacts the OCM catalyst to initiate an OCM reaction and produce the OCM effluent 611. Accordingly, at least a portion of the H2 and CO byproducts generated in the OCM reaction can be recycled to an OCM reactor of the OCM subsystem 601 as reactants that contact the combustion catalyst to autothermally heat the gas mixture feed 610 within the OCM reactor and thereby generate the heated gas mixture that contacts the OCM catalyst to initiate the OCM reaction and produce the C2+ compounds.

[00111] Although not shown in FIG. 6, it is contemplated that an ignition component, as previously described, could be injected into an OCM reactor of the OCM subsystem 601. Furthermore, it is contemplated that a stream comprising H2, CO, or both (e.g., syngas) could be added to the hydrocarbon stream that is directed to the mixing device 609 to form the gas mixture feed 610.

[00112] With continued reference to FIG. 6, the second stream 615 comprising C2+ compounds including C2H4 and C2H6 may be directed to the C2 purification unit 608. The C2 purification unit 608 is fluidly coupled to the OCM subsystem 601 and is configured to receive the second stream 615 and to separate the second stream 615 into at least a third stream 621 comprising C2H4 and a fourth stream 622 comprising C2H6. The third stream 621 comprising C2H4 may be collected or directed to a downstream process that utilizes C2H4 as a feedstock. As seen in FIG. 6, the fourth stream 622 comprising C2H6 may be recycled to the OCM subsystem 601 (e.g., to an OCM reactor or to a PBC unit) to produce additional C2H4 and H2 by cracking the C2H6. In some aspects of the methods and systems of the present disclosure, the C2 purification unit 608 may include a deethanizer unit (not shown) that is capable of separating C2 compounds (e.g., ethane and ethylene) from C3+ compounds (e.g., propane, propylene, butane, butene). Separated C3+ compounds can leave the deethanizer unit along stream 623 and undergo additional downstream processing. The C2 compounds from the deethanizer unit can be directed to a C2 splitter (not shown), which can separate C2H6 from C2H4. The C2 splitter can be a distillation column.

[00113] All references to singular characteristics or limitations of the present disclosure shall include the corresponding plural characteristic or limitation, and vice versa, unless otherwise specified or clearly implied to the contrary by the context in which the reference is made.

[00114] All combinations of method or process steps as used herein can be performed in any order, unless otherwise specified or clearly implied to the contrary by the context in which the referenced combination is made.

[00115] All ranges and parameters, including but not limited to percentages, parts, and ratios, disclosed herein are understood to encompass any and all sub-ranges assumed and subsumed therein, and every number between the endpoints. For example, a stated range of “1 to 10” should be considered to include any and all subranges between (and inclusive of) the minimum value of 1 and the maximum value of 10; that is, all subranges beginning with a minimum value of 1 or more (e.g., 1 to 6.1), and ending with a maximum value of 10 or less (e.g., 2.3 to 9.4, 3 to 8, 4 to 7), and finally to each number 1, 2, 3, 4, 5, 6, 7, 8, 9, and 10 contained within the range.

[00116] The methods and systems of the present disclosure can comprise, consist of, or consist essentially of the essential elements and limitations of the disclosure as described herein, as well as any additional or optional components or features described herein or otherwise known to be useful in hydrocarbon or petrochemical processing applications, including oxidative coupling of methane applications.

[00117] To the extent that the terms “include,” “includes,” or “including” are used in the specification or the claims, they are intended to be inclusive in a manner similar to the term “comprising” as that term is interpreted when employed as a transitional word in a claim. Furthermore, to the extent that the term “or” is employed (e.g., A or B), it is intended to mean “A or B or both A and B.” When the Applicant intends to indicate “only A or B but not both,” then the term “only A or B but not both” will be employed. Thus, use of the term “or” herein is the inclusive, and not the exclusive use. Furthermore, the phrase “at least one of A, B, and C” should be interpreted as “only A or only B or only C or any combinations thereof.” In the present disclosure, the words “a” or “an” are to be taken to include both the singular and the plural. Conversely, any reference to plural items shall, where appropriate, include the singular.

[00118] In accordance with the present disclosure, it is possible to utilize the various inventive concepts in combination with one another. Additionally, any particular feature recited as relating to a particularly disclosed aspect of the methods and systems of the present disclosure should be interpreted as available for use with all disclosed aspects of the methods and systems of the present disclosure, unless incorporation of the particular feature would be contradictory to the express terms of the disclosed aspect. Additional advantages and modifications will be readily apparent to those skilled in the art. Therefore, the disclosure, in its broader aspects, is not limited to the specific details presented therein, the representative apparatus, or the illustrative examples shown and described. Accordingly, departures may be made from such details without departing from the spirit or scope of the general inventive concepts.

[00119] The scope of the general inventive concepts presented herein is not intended to be limited to the particular exemplary aspects shown and described herein. From the disclosure given, those skilled in the art will not only understand the general inventive concepts and their attendant advantages, but will also find apparent various changes and modifications to the devices, systems, and methods disclosed. It is sought, therefore, to cover all such changes and modifications as fall within the spirit and scope of the general inventive concepts, as described and/or claimed herein, and any equivalents thereof.