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Title:
MICROSTRUCTURE SUBSTRATE AND METHOD FOR MANUFACTURING SAME, AND DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/196060
Kind Code:
A1
Abstract:
Provided are a microstructure substrate and a method for manufacturing same, and a display device. The method comprises: coating a substrate base (11) with a fingerprint resistant film layer (12); sputtering a silicon dioxide layer (13) on the fingerprint resistant film layer (12); and etching the silicon dioxide layer (13) so as to fabricate the silicon dioxide layer (13) having multiple arc recess microstructures. The present invention can improve the influence of a microstructure on the picture quality of a high resolution panel, and reduce the blurriness of the picture, so that it is possible that the base is applied to the high resolution panel.

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Inventors:
YANG YONG (CN)
Application Number:
PCT/CN2017/085087
Publication Date:
November 01, 2018
Filing Date:
May 19, 2017
Export Citation:
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Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
G02B5/02; G02B1/18
Foreign References:
CN103608700A2014-02-26
CN105950042A2016-09-21
CN201259555Y2009-06-17
US20040017364A12004-01-29
Attorney, Agent or Firm:
CHINA WISPRO INTELLECTUAL PROPERTY LLP. (CN)
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