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Title:
MIRROR FOR EXTREME ULTRAVIOLET LIGHT, AND EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/077734
Kind Code:
A1
Abstract:
This mirror for extreme ultraviolet light comprises a substrate, a multilayer film that is provided on the substrate and reflects extreme ultraviolet light, and a capping layer that is provided on the multilayer film, wherein the capping layer may be configured to include a photocatalyst layer that includes a photocatalyst, an auxiliary catalyst layer that is positioned between the photocatalyst layer and the multilayer film and includes a metal, said metal assisting the photocatalytic ability of the photocatalyst included in the photocatalyst layer, and a barrier layer that is positioned between the auxiliary catalyst layer and the multilayer film and suppresses diffusion of the metal into the multilayer film.

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Inventors:
WAKABAYASHI OSAMU (JP)
HONDA YOSHIYUKI (JP)
Application Number:
PCT/JP2017/037992
Publication Date:
April 25, 2019
Filing Date:
October 20, 2017
Export Citation:
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Assignee:
GIGAPHOTON INC (JP)
International Classes:
G03F7/20
Foreign References:
JP2006170916A2006-06-29
JP2005098903A2005-04-14
Attorney, Agent or Firm:
MORIMURA Yasuo (JP)
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