Title:
MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE APPARATUS COMPRISING A SPECTRAL FILTER IN THE FORM OF A GRATING STRUCTURE AND METHOD FOR PRODUCING A SPECTRAL FILTER IN THE FORM OF A GRATING STRUCTURE ON A MIRROR
Document Type and Number:
WIPO Patent Application WO/2020/109225
Kind Code:
A3
Abstract:
A mirror for an illumination optical unit (4) of a projection exposure apparatus (1) comprises a spectral filter in the form of a grating structure (30), wherein the grating structure (30) has a maximum edge steepness (b) in the range of 15° to 60°.
Inventors:
JALICS CHRISTOF (DE)
SCHUSTER FABIAN (DE)
KIEREY HOLGER (DE)
SANDNER ANDREAS (DE)
MEISCH TOBIAS (DE)
SCHUSTER FABIAN (DE)
KIEREY HOLGER (DE)
SANDNER ANDREAS (DE)
MEISCH TOBIAS (DE)
Application Number:
PCT/EP2019/082407
Publication Date:
July 30, 2020
Filing Date:
November 25, 2019
Export Citation:
Assignee:
ZEISS CARL SMT GMBH (DE)
International Classes:
G02B5/08; G02B5/18; G02B27/42; G03F7/20
Domestic Patent References:
WO2017036717A2 | 2017-03-09 |
Foreign References:
EP3076208A1 | 2016-10-05 | |||
US5907436A | 1999-05-25 |
Other References:
MAHYAR DEHDAST ET AL: "A novel trapezoidal profile of optimized diffraction grating for light trapping in thin silicon solar cells", OPTICA APPLICATA, 1 January 2017 (2017-01-01), XP055461187, Retrieved from the Internet [retrieved on 20200220], DOI: 10.5277/oa170107
Attorney, Agent or Firm:
RAU, SCHNECK & HÜBNER PATENTANWÄLTE RECHTSANWÄLTE PARTGMBB (DE)
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