Title:
MIRROR AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2022/270475
Kind Code:
A1
Abstract:
The present invention pertains to a mirror having, on a substrate, a stress relaxation layer, a high reflection film layer, and an enhanced reflection film layer in the stated order. The present invention also pertains to a method for manufacturing a mirror, the method including a stress relaxation layer formation step for forming a stress relaxation layer on a substrate, a high reflection film layer formation step for forming a high reflection film layer on the stress relaxation layer, and an enhanced reflection film layer formation step for forming an enhanced reflection film layer on the high reflection film layer.
Inventors:
NISHIKAWA YASUHISA (JP)
ARAE TOMOYUKI (JP)
MORIMOTO TAMOTSU (JP)
ARAE TOMOYUKI (JP)
MORIMOTO TAMOTSU (JP)
Application Number:
PCT/JP2022/024576
Publication Date:
December 29, 2022
Filing Date:
June 20, 2022
Export Citation:
Assignee:
AGC INC (JP)
International Classes:
G02B5/08
Domestic Patent References:
| WO2007013269A1 | 2007-02-01 | |||
| WO2015194455A1 | 2015-12-23 | |||
| WO2017018393A1 | 2017-02-02 |
Foreign References:
| JP2015145936A | 2015-08-13 | |||
| JP2000241612A | 2000-09-08 | |||
| JP2003004919A | 2003-01-08 | |||
| JP2007147667A | 2007-06-14 | |||
| JP2004219974A | 2004-08-05 | |||
| JP2007163614A | 2007-06-28 | |||
| JP2011242522A | 2011-12-01 | |||
| JP2018016859A | 2018-02-01 |
Attorney, Agent or Firm:
EIKOH PATENT FIRM, P.C. (JP)
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