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Title:
MOLD RELEASE TREATMENT METHOD, AND ANTIREFLECTIVE FILM PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2012/133390
Kind Code:
A1
Abstract:
A mold release treatment method which can be employed suitably for a mold having a porous alumina layer on the surface thereof. The mold release treatment method comprises the steps of: (a) preparing a mold release agent comprising a fluorine-containing compound having a mold release property and a solvent and a mold (100A) having a porous alumina layer (14) on the surface thereof; (b) applying the mold release agent onto the surface of the mold (100A); (c) removing the solvent contained in the mold release agent on the surface of the mold (100A); and (d), subsequent to the step (c), performing the steps (b) and (c).

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Inventors:
MINOURA KIYOSHI
ISURUGI AKINOBU
Application Number:
PCT/JP2012/057896
Publication Date:
October 04, 2012
Filing Date:
March 27, 2012
Export Citation:
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Assignee:
SHARP KK (JP)
MINOURA KIYOSHI
ISURUGI AKINOBU
International Classes:
B29C33/62; B29C33/38; B29C39/02; B29C59/02
Domestic Patent References:
WO2011118591A12011-09-29
WO2011111669A12011-09-15
Foreign References:
JP2010005841A2010-01-14
JP2006116896A2006-05-11
JPS63120634A1988-05-25
Attorney, Agent or Firm:
OKUDA SEIJI (JP)
Seiji Okuda (JP)
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Claims:



 
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