Title:
MOLD FOR STEP-AND-REPEAT IMPRINTING, AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2016/006592
Kind Code:
A1
Abstract:
Provided is a mold for step-and-repeat imprinting that is, when removing the mold, capable of suppressing deformation of the edges of a relief pattern formed on a cured resin layer. The present invention provides a mold 2 for step-and-repeat imprinting, comprising: a transparent substrate 4; a transparent resin layer 6 that is formed on the transparent substrate and includes a pattern region 13 having a relief pattern 3 formed thereon; and a light shielding member 5 provided between the transparent substrate and the transparent resin layer so as to overlap with the pattern region at part of the pattern region.
Inventors:
MIYAZAWA YUKIHIRO (JP)
Application Number:
PCT/JP2015/069485
Publication Date:
January 14, 2016
Filing Date:
July 07, 2015
Export Citation:
Assignee:
SOKEN KAGAKU KK (JP)
International Classes:
H01L21/027; B29C33/38; B29C59/02
Foreign References:
| JP2013038117A | 2013-02-21 | |||
| JP2014097600A | 2014-05-29 | |||
| JP2010253753A | 2010-11-11 | |||
| US20080305410A1 | 2008-12-11 | |||
| JP2010074162A | 2010-04-02 | |||
| JP2009212449A | 2009-09-17 |
Other References:
See also references of EP 3168863A4
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
SK patent business corporation (JP)
SK patent business corporation (JP)
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