Title:
MONITORING SYSTEM AND MONITORING METHOD
Document Type and Number:
WIPO Patent Application WO/2020/188697
Kind Code:
A1
Abstract:
Provided is a monitoring system that can reduce a photographing mistake when an object detected by a radar device is photographed by a camera. The monitoring system of the present example comprises: a radar device 10 that detects foreign matter existing inside a monitoring area; a camera 20 that photographs the foreign matter detected by the radar device 10; a monitor 30 that displays an image photographed by the camera 20; and a signal processing device 40 that controls an operation of the camera 20. In addition, the signal processing device 40 adjusts a direction angle of the camera 20 on the basis of coordinates on a two-dimensional plane of a point where the foreign matter is detected, adjusts a depression angle of the camera 20 on the basis of a terrain height at the point where the foreign matter is detected, and adjusts a photographing magnification of the camera 20 on the basis of a distance from the camera 20 to the foreign matter in a three-dimensional space.
Inventors:
HARAMOTO RYOKI (JP)
Application Number:
PCT/JP2019/011160
Publication Date:
September 24, 2020
Filing Date:
March 18, 2019
Export Citation:
Assignee:
HITACHI INT ELECTRIC INC (JP)
International Classes:
G01S13/86; G01S13/91; G08B13/181; H04N7/18
Foreign References:
| JP2007184780A | 2007-07-19 | |||
| JP2003157487A | 2003-05-30 | |||
| JP2011164071A | 2011-08-25 | |||
| JPH095434A | 1997-01-10 | |||
| JP2014006188A | 2014-01-16 | |||
| JP2006270404A | 2006-10-05 |
Attorney, Agent or Firm:
TAMURA Chikashi et al. (JP)
Download PDF: