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Title:
MONOMERS HAVING ELECTRON-WITHDRAWING GROUPS AND PROCESSES FOR PREPARING THE SAME
Document Type and Number:
WIPO Patent Application WO/2002/036533
Kind Code:
A1
Abstract:
Monomers having electron-withdrawing groups, as represented by the general formula (a), (b) or (c), wherein A?1¿, A?2¿, and A?3¿ are each a ring; R?a¿, R?b¿, R?c¿, and R?u¿ are each independently hydrogen or an organic group; at least one of R?s¿, R?w¿, and R?v¿, at least one of R?t¿ and R?w1¿, and at least one of the two R?w2¿s are each an electron-withdrawing group, and the others are each hydrogen or an organic group; W?1¿ is a single bond or a connecting group; and n is an integer of 2 to 25, with the proviso that two or more of R?a¿, R?b¿, R?c¿, R?s¿, R?t¿, R?u¿, R?v¿, R?w¿, R?w1¿, R?w2¿, W?1¿, and the constituent carbon atoms of A?1¿, A?2¿, and A?3¿ may be united to form a ring. The electron-withdrawing group defined for R?s¿, R?t¿, R?v¿, R?w¿, R?w1¿, and R?w2¿ is a fluorine-containing group or the like. The monomers are useful as raw material in producing polymers for photoresists.

Inventors:
INOUE KEIZO (JP)
Application Number:
PCT/JP2001/009530
Publication Date:
May 10, 2002
Filing Date:
October 31, 2001
Export Citation:
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Assignee:
DAICEL CHEM (JP)
INOUE KEIZO (JP)
International Classes:
C07C33/44; C07C35/52; C07C41/01; C07C41/06; C07C41/58; C07C43/192; C07C43/196; C07C43/313; C07C49/755; C07D307/30; C07D307/93; C07D313/10; C07D317/42; C07D339/06; C08F24/00; G03F7/004; G03F7/039; (IPC1-7): C07C33/44; C07D313/06; C07D307/77; C07D317/42; C07D307/30; C07D339/06; C08F24/00; C08F32/00; G03F7/039
Foreign References:
EP0157262A11985-10-09
JPS6422866A1989-01-25
Other References:
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See also references of EP 1331216A4
Attorney, Agent or Firm:
Goto, Yukihisa (Higashitenma 2-chome Kita-ku Osaka-shi, Osaka, JP)
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