MULTI CHARGED PARTICLE BEAM DRAWING DEVICE AND MULTI CHARGED PARTICLE BEAM DRAWING METHOD

WIPO Patent Application WO/2022/030064

A1

A multi charged particle beam drawing device according to one aspect of the present invention is characterized by comprising: a beam formation mechanism that forms a multi charged particle beam; a block region generation circuit that generates a plurality of block regions from a region irradiated with the multi charged particle beam, the irradiated region being obtained by combining small regions in which each beam of the multi charged particle beam is surrounded by a plurality of other beams adjacent thereto; and a drawing mechanism that performs multiple drawing by performing drawing such that each block region is irradiated with the multi charged particle beam by at least any drawing processing of the multiple drawing, and such that each drawing processing of the multiple drawing uses one of the plurality of block regions to irradiate the block region in each drawing processing to cover the drawing region of a sample without overlaps.

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KATO YASUO (JP)
KAWANA RYOH (JP)
HAYAMI MASAO (JP)

PCT/JP2021/018381

February 10, 2022

May 14, 2021

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NUFLARE TECHNOLOGY INC (JP)

H01J37/305; G03F7/20; H01L21/027

JP2018182189A	2018-11-15
JP2017011270A	2017-01-12
JP2016225357A	2016-12-28
JP2013045838A	2013-03-04
JP2004015069A	2004-01-15

IKEGAMI, Tetsuma et al. (JP)

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