Title:
MULTI DIRECTIONAL MECHANICAL SCANNING IN AN ION IMPLANTER
Document Type and Number:
WIPO Patent Application WO2004001789
Kind Code:
A3
Abstract:
An end station for an ion implanter has a vacuum chamber (18) which receives an ion beam (19). The wafer holder (22) is mounted at the distal end (23) of a scanning arm (24) which has its proximal end (25) attached to the chamber wall (26). The scanning arm has at least two rotary joints (27, 28) providing articulation of the arm (24) to permit movement of the wafer holder in two orthogonal scan directions in a scan plane transverse to the beam path (21) through the vacuum chamber. A scanning arm driver moves the substrate holder in the scan plane in a desired two-dimensional scan pattern relative to the beam path.
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Inventors:
NAYLOR-SMITH RICHARD (GB)
DILLON SIMON FREDERICK (GB)
COOKE RICHARD (GB)
DILLON SIMON FREDERICK (GB)
COOKE RICHARD (GB)
Application Number:
PCT/GB2003/002691
Publication Date:
April 01, 2004
Filing Date:
June 20, 2003
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
NAYLOR-SMITH RICHARD (GB)
DILLON SIMON FREDERICK (GB)
COOKE RICHARD (GB)
NAYLOR-SMITH RICHARD (GB)
DILLON SIMON FREDERICK (GB)
COOKE RICHARD (GB)
International Classes:
H01J37/00; H01J37/08; H01J37/302; H01J37/317; H01L21/265; (IPC1-7): H01J37/317
Foreign References:
| US5194748A | 1993-03-16 | |||
| US5898179A | 1999-04-27 | |||
| US5956077A | 1999-09-21 |
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