Title:
MULTI-ELECTRON BEAM INSPECTION DEVICE AND ADJUSTMENT METHOD OF SAME
Document Type and Number:
WIPO Patent Application WO/2022/038841
Kind Code:
A1
Abstract:
According to the present invention, one desired beam among multiple beams is quickly aligned with a small diameter aperture. This multi-electron beam inspection device comprises: a beam selection aperture substrate provided with a first passage hole through which all of the multiple electron beams pass, a second passage hole through which one of the multiple electron beams can pass, a first slit, and a second slit that is non-parallel to the first slit; an aperture moving unit which moves the beam selection aperture substrate; a first detector which detects, among the multiple electron beams, the current of the beam that has passed through the first slit and the current of the beam that has passed through the second slit; and a second detector which detects a multi-secondary electron beam containing reflected electrons emitted from the substrate by irradiating the substrate with the multiple electron beams that have passed through the first passage hole, and inspects the substrate on the basis of the output signal from the second detector.
Inventors:
ISHII KOICHI (JP)
INOUE KAZUHIKO (JP)
MIKAMI SHOHEI (JP)
AKIBA TOSHIKATSU (JP)
INOUE KAZUHIKO (JP)
MIKAMI SHOHEI (JP)
AKIBA TOSHIKATSU (JP)
Application Number:
PCT/JP2021/017621
Publication Date:
February 24, 2022
Filing Date:
May 10, 2021
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC (JP)
International Classes:
H01J37/09; G01N23/2251; H01J37/04; H01J37/244; H01J37/28; H01L21/66
Foreign References:
| JP2019204694A | 2019-11-28 | |||
| JP2006024624A | 2006-01-26 | |||
| JP2005257495A | 2005-09-22 |
Attorney, Agent or Firm:
SHIGENO, Tsuyoshi et al. (JP)
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