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Patent Searching and Data


Title:
MULTILAYER FILM
Document Type and Number:
WIPO Patent Application WO/2023/013406
Kind Code:
A1
Abstract:
The present invention provides a multilayer film which has both blocking resistance and smoothness. A multilayer film which comprises a front surface layer that is configured from a resin composition containing a vinylidene fluoride resin and a methacrylic acid ester resin, and a back surface layer that is superposed on the front surface layer and is configured from a resin composition containing a methacrylic acid ester resin and fine particles having a particle diameter of 0.2 µm or more, wherein: the average particle diameter of the fine particles is less than 1.0 µm; and with respect to protrusions present on the outer surface of the back surface layer, the number of protrusions having a height of 0.2 µm or more relative to the height of the average surface per 697 µm × 539 µm area is 400 or less as determined using a white interferometer, while the number of protrusions having a height of 1 µm or more per 697 µm × 539 µm area is 10 or less as determined using a white interferometer.

Inventors:
YASUMOTO NORIAKI (JP)
MIYAMURA YASUSHI (JP)
TAKANO KEIJI (JP)
Application Number:
PCT/JP2022/028097
Publication Date:
February 09, 2023
Filing Date:
July 19, 2022
Export Citation:
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Assignee:
DENKA COMPANY LTD (JP)
International Classes:
B32B27/30; B32B27/00
Domestic Patent References:
WO2021161899A12021-08-19
WO2015137309A12015-09-17
WO2011142453A12011-11-17
Foreign References:
JP2010275434A2010-12-09
JP2016044300A2016-04-04
JP2017181990A2017-10-05
JP2012187934A2012-10-04
JP2021123082A2021-08-30
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (JP)
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