Title:
MULTIPASS INTERFERENCE CORRECTION AND MATERIAL RECOGNITION BASED ON PATTERNED ILLUMINATION WITHOUT FRAME RATE LOSS
Document Type and Number:
WIPO Patent Application WO/2023/058839
Kind Code:
A1
Abstract:
The method includes simultaneously illuminating a scene by at least two light sources, each light source emitting structured light having a spatial pattern, a wavelength and/or a polarization, wherein the spatial pattern, the wavelength and/or the polarization of each structured light differ from each other, respectively, capturing an image of the scene simultaneously illuminated by the at least two light sources by an imaging sensor through a filter array, wherein one pixel of the imaging sensor captures the image through one filter of the filter array, calculating, for each pixel, intensity values of direct and global components of the light received by the pixel from a system of equations compiled for each joint pixel, and performing, for each pixel, image correction by assigning to each pixel its calculated intensity value of the direct component to obtain a corrected image.
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Inventors:
SEMENOV VLADIMIR MIKHAILOVICH (RU)
SUVORINA ANASTASIIA SERGEEVNA (RU)
LYCHAGOV VLADISLAV VALER'EVICH (RU)
MEDVEDEV ANTON SERGEEVICH (RU)
DOROKHOV EVGENY ANDREEVICH (RU)
MAMMYKIN GENNADY DMITRIEVICH (RU)
SUVORINA ANASTASIIA SERGEEVNA (RU)
LYCHAGOV VLADISLAV VALER'EVICH (RU)
MEDVEDEV ANTON SERGEEVICH (RU)
DOROKHOV EVGENY ANDREEVICH (RU)
MAMMYKIN GENNADY DMITRIEVICH (RU)
Application Number:
PCT/KR2022/008617
Publication Date:
April 13, 2023
Filing Date:
June 17, 2022
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO LTD (KR)
International Classes:
G06T5/00; G02B5/20; G06V10/10
Foreign References:
| US20180341008A1 | 2018-11-29 | |||
| US20160334509A1 | 2016-11-17 | |||
| EP3508814A1 | 2019-07-10 | |||
| US20180033146A1 | 2018-02-01 | |||
| US20200240774A1 | 2020-07-30 |
Attorney, Agent or Firm:
Y.P.LEE, MOCK & PARTNERS (KR)
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