Title:
NEAR-PERFECT LIGHT ABSORBER AND UNIVERSAL PREPARATION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2023/280263
Kind Code:
A1
Abstract:
Disclosed are a near-perfect light absorber and a universal preparation method therefor. The light absorber consists of a polymer film and a light dissipation layer; the polymer film and the light dissipation layer both have conical structures which do not penetrate through the whole film; and the polymer film is made of a high-molecular polymer which can generate an etchable latent track after being irradiated by heavy ions. The light absorber has efficient light absorption in a wavelength range of 250-14000 nm, especially in a wavelength range of 600-950 nm, the average light absorption rate can reach up to 99.97%, and the light absorber can be used in the fields of light-heat water treatment, etc.
Inventors:
DUAN JINGLAI (CN)
LV SHUANGBAO (CN)
HU ZHENGGUO (CN)
XU HUSHAN (CN)
LIU JIE (CN)
YAO HUIJUN (CN)
MO DAN (CN)
WANG YUE (CN)
CHEN YONGHUI (CN)
LV SHUANGBAO (CN)
HU ZHENGGUO (CN)
XU HUSHAN (CN)
LIU JIE (CN)
YAO HUIJUN (CN)
MO DAN (CN)
WANG YUE (CN)
CHEN YONGHUI (CN)
Application Number:
PCT/CN2022/104324
Publication Date:
January 12, 2023
Filing Date:
July 07, 2022
Export Citation:
Assignee:
INST MODERN PHYSICS CAS (CN)
International Classes:
G02B5/00; C23C14/02; C23C14/06; C23C14/20; C25D5/56
Foreign References:
| CN113640906A | 2021-11-12 | |||
| CN108732663A | 2018-11-02 | |||
| CN109251347A | 2019-01-22 | |||
| CN111295602A | 2020-06-16 | |||
| CN112201705A | 2021-01-08 | |||
| CN112973458A | 2021-06-18 | |||
| CN103513316A | 2014-01-15 |
Attorney, Agent or Firm:
JEEKAI&PARTNERS (CN)
Download PDF: