Title:
NEGATIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2006/120845
Kind Code:
A1
Abstract:
Disclosed is a negative resist composition which is sensitive to g rays, i rays, KrF excimer lasers and electron beams and can be used in a mix-and-match process wherein exposure is performed by using at least two exposure light sources selected from g rays, i rays, KrF excimer lasers and electron beams. Also disclosed is a negative resist composition which enables to form a high-resolution resist pattern having excellent plating resistance and can be suitably used for manufacturing an MEMS. Further disclosed is a method for forming a resist pattern. Specifically disclosed is a negative resist composition used in a process wherein exposure is performed by using at least two exposure light sources selected from g rays, i rays, KrF excimer lasers and electron beams, which composition contains an alkali-soluble resin component (A), an acid generator component (B) which generates an acid when exposed to a g ray, an i ray, a KrF excimer laser or an electron beam, and a crosslinking agent component (C). Also specifically disclosed is a negative resist composition for manufacturing an MEMS, which composition contains an alkali-soluble novolac resin (A), an acid generator component (B) which generates an acid when irradiated with radiation, and a crosslinking agent component (C).
Inventors:
SHIMBORI HIROSHI (JP)
Application Number:
PCT/JP2006/308130
Publication Date:
November 16, 2006
Filing Date:
April 18, 2006
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
SHIMBORI HIROSHI (JP)
SHIMBORI HIROSHI (JP)
International Classes:
G03F7/038; G03F7/004; H01L21/027
Foreign References:
| JP2001209179A | 2001-08-03 | |||
| JP2004503830A | 2004-02-05 | |||
| JP2004004760A | 2004-01-08 | |||
| JP2003055341A | 2003-02-26 | |||
| JPH1115158A | 1999-01-22 | |||
| JP2002508774A | 2002-03-19 | |||
| JPH097924A | 1997-01-10 | |||
| JPH10242038A | 1998-09-11 | |||
| JP2002280637A | 2002-09-27 | |||
| JP2003133615A | 2003-05-09 |
Attorney, Agent or Firm:
Tanai, Sumio (Yaesu Chuo-ku, Tokyo53, JP)
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