Title:
NEGATIVE-WORKING PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2020/044918
Kind Code:
A1
Abstract:
[Problem] To provide a novel negative-working photosensitive resin composition. [Solution] A negative-working photosensitive resin composition comprising a component (A), a component (B) in an amount of 80 to 90% by mass relative to 100% by mass of the component (A), a component (C) in an amount of 3 to 20% by mass relative to 100% by mass, i.e., the whole amount, of the component (B), and a solvent: (A): an alkali soluble polymer; (B): at least two crosskinkable compounds each having at least two polymerizable groups selected from the group consisting of an acryloyloxy group, a methacryloyloxy group, an allyl group and a vinyl group per molecule; and (C): at least one photopolymerization initiator.
Inventors:
SUZUKI TOMOYA (JP)
ADACHI ISAO (JP)
ADACHI ISAO (JP)
Application Number:
PCT/JP2019/029854
Publication Date:
March 05, 2020
Filing Date:
July 30, 2019
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
G03F7/033; C08F220/06; G02B1/04; G02B3/00; G03F7/027
Domestic Patent References:
| WO2006121112A1 | 2006-11-16 |
Foreign References:
| JP2010020077A | 2010-01-28 | |||
| JP2007140174A | 2007-06-07 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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