Title:
NEUTRAL BEAM FORMATION DEVICE, SURFACE ANALYSIS DEVICE, NEUTRAL BEAM FORMATION METHOD, AND SURFACE ANALYSIS METHOD
Document Type and Number:
WIPO Patent Application WO/2012/137787
Kind Code:
A1
Abstract:
[Problem] To provide a neutral beam formation device, surface analysis device that uses the same, neutral beam formation method, and surface analysis method capable of measuring the intensity of a neutral beam. [Solution] The present invention is characterized in comprising: a neutralization chamber (3) for introducing a neutral gas and using the neutral gas to neutralize and convert an ion beam to a neutral beam; and a neutral beam intensity monitoring mechanism for monitoring the intensity of the neutral beam. The neutral beam intensity monitoring mechanism measures the charge of charged particles produced when the neutral gas is charged by the charge exchange reaction between the neutral gas and the ion beam.
Inventors:
NAKANISHI SHIGEMITSU (JP)
HIGASHITSUTSUMI HIDEAKI (JP)
HIGASHITSUTSUMI HIDEAKI (JP)
Application Number:
PCT/JP2012/059108
Publication Date:
October 11, 2012
Filing Date:
April 03, 2012
Export Citation:
Assignee:
PASCAL CO LTD (JP)
NAKANISHI SHIGEMITSU (JP)
HIGASHITSUTSUMI HIDEAKI (JP)
NAKANISHI SHIGEMITSU (JP)
HIGASHITSUTSUMI HIDEAKI (JP)
International Classes:
H05H3/02; G01N23/20; G01N23/225; H01J37/04
Foreign References:
| JPH08233998A | 1996-09-13 | |||
| JPH06139993A | 1994-05-20 | |||
| JPH05326190A | 1993-12-10 | |||
| JP2006190617A | 2006-07-20 |
Attorney, Agent or Firm:
WATANABE SEIICHI (JP)
Seiichi Watanabe (JP)
Seiichi Watanabe (JP)
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