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Title:
Ni-Ta SYSTEM ALLOY, TARGET MATERIAL AND MAGNETIC RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2018/062189
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: an Ni-Ta system alloy which is free from composition unevenness and has improved mechanical strength, and wherein Ta compound phases are finely dispersed by adding a predetermined amount of Fe and/or Co into the Ni-Ta system alloy; a sputtering target material which contains this Ni-Ta system alloy; and a magnetic recording medium. In order to solve the problem, the present invention provides an Ni-Ta system alloy which contains 15-50 at% of Ta and 0-10 at% in total of one or more elements selected from among Al, Ga, In, Si, Ge, Sn, Zr, Ti, Hf, B, Cu, P, C, Ru and Cr, with the balance made up of Ni, unavoidable impurities and Fe and/or Co. This Ni-Ta system alloy is configured such that: the proportions of the Ni content, the Fe content and the Co content relative to the total content of Ni, Fe and Co are 20-98.5%, 0-50% and 0-60%, respectively; the Ni-Ta system alloy has an FCC phase and a Ta compound phase; and the diameter of the maximum inscribed circle that is able to be drawn inside the Ta compound phase is 10 μm or less.

Inventors:
IMOTO MIYUKI (JP)
Application Number:
PCT/JP2017/034762
Publication Date:
April 05, 2018
Filing Date:
September 26, 2017
Export Citation:
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Assignee:
SANYO SPECIAL STEEL CO LTD (JP)
International Classes:
C22C19/03; C22C27/02; C22C30/00; C22C30/02; C22C30/04; C23C14/34; G11B5/738; G11B5/851
Foreign References:
JP2013127111A2013-06-27
US7828913B12010-11-09
JPS62235448A1987-10-15
JPS6233735A1987-02-13
JP2017210647A2017-11-30
Attorney, Agent or Firm:
NAGAI Hiroshi et al. (JP)
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