Title:
NICKEL-CONTAINING FILM‑FORMATION MATERIAL, AND NICKEL-CONTAINING FILM‑FABRICATION METHOD
Document Type and Number:
WIPO Patent Application WO/2010/032673
Kind Code:
A1
Abstract:
Disclosed is a nickel-containing film‑formation material that does not easily cause residual carbon in the nickel-containing film, and that is not prone to by-production of HF, in film formation by CVD (chemical vapor deposition). Further disclosed is a nickel-containing film‑formation material in which the nickel-containing film is a nickel silicide film.
The nickel-containing film formation material is characterized by containing at least one type of nickel complex selected from a group comprising Ni(PF2(CF3))4, Ni(PF(CF3)2)4, Ni(P(CF3)3)4, Ni(PF2R2)4, Ni(PFR3R4)4, and Ni(PF2NR1R5)4 (wherein R1 through R5 each individually represent H or an alkyl group or phenyl group with 1‑6 carbons.).
Inventors:
AOKI TAKANORI (JP)
KOBAYASHI TAKAMITSU (JP)
KOBAYASHI TAKAMITSU (JP)
Application Number:
PCT/JP2009/065823
Publication Date:
March 25, 2010
Filing Date:
September 10, 2009
Export Citation:
Assignee:
SHOWA DENKO KK (JP)
AOKI TAKANORI (JP)
KOBAYASHI TAKAMITSU (JP)
AOKI TAKANORI (JP)
KOBAYASHI TAKAMITSU (JP)
International Classes:
C23C16/18; H01L21/28; H01L21/285; C07F9/52; C07F15/04
Foreign References:
| JP2006045649A | 2006-02-16 |
Other References:
NIXON, JOHN F. ET AL.: "Phosphorus-fluorine compounds. XIV. Direct syntheses of tetrakis (fluorophosphine) complexes of zerovalent nickel", JOURNAL OF THE CHEMICAL SOCIETY (A): INORGANIC, PHYSICAL, THEORETICAL, vol. 7, 1969, pages 1089 - 1091
SEEL, FRITZ ET AL.: "Fluophosphine complexes of nickel", CHEMISCHE BERICHTE, vol. 94, 1961, pages 1173 - 1184
SEEL, FRITZ ET AL.: "Fluophosphine complexes of nickel", CHEMISCHE BERICHTE, vol. 94, 1961, pages 1173 - 1184
Attorney, Agent or Firm:
SSINPAT PATENT FIRM (JP)
Patent business corporation SSINPAT (JP)
Patent business corporation SSINPAT (JP)
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