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Title:
NOVEL AROMATIC SULFONIUM COMPOUNDS, PHOTOACID GENERATORS COMPRISING THE SAME, PHOTOPOLYMERIZABLE COMPOSITIONS CONTAINING THE SAME, STEREOLITHOGRAPHIC RESIN COMPOSITIONS, AND STEREOLITHOGRAPHIC PROCESS
Document Type and Number:
WIPO Patent Application WO/1999/028295
Kind Code:
A1
Abstract:
Novel aromatic sulfonium compounds of general formula (I), photoacid generators comprising the same, and photopolymerizable compositions containing the same, capable of providing stereolithographic resin compositions which do not suffer from the hindrance to curing by oxygen, can easily give shaped articles having desired sizes by virtue of the high accuracy thereof in curing, and can attain a satisfactory curing depth owing to the high sensitivity thereof for radiant energy; and a stereolithographic process.

Inventors:
OHKAWA KAZUO (JP)
TACHIKAWA HIROYUKI (JP)
CHIKAOKA SATOYUKI (JP)
Application Number:
PCT/JP1998/005472
Publication Date:
June 10, 1999
Filing Date:
December 04, 1998
Export Citation:
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Assignee:
ASAHI DENKA KOGYO KK (JP)
OHKAWA KAZUO (JP)
TACHIKAWA HIROYUKI (JP)
CHIKAOKA SATOYUKI (JP)
International Classes:
C07C381/12; C08F2/50; C08G59/68; C08G85/00; C08K5/36; G03F7/00; G03F7/004; G03F7/029; G03F7/038; (IPC1-7): C07C381/12; C08F2/50; C08F20/20; C08F299/00; C08G59/40; G03F7/004
Foreign References:
JPH0761964A1995-03-07
JPH10226658A1998-08-25
Other References:
See also references of EP 1036789A4
Attorney, Agent or Firm:
Honda, Ichiro (Nishikanda 2-chome Chiyoda-ku Tokyo, JP)
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