Title:
NOVEL COMPOUND, ACID GENERATOR, CHEMICAL AMPLIFICATION TYPE PHOTORESIST COMPOSITION, RESIST LAYER LAMINATE AND METHOD OF FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2007/046442
Kind Code:
A1
Abstract:
A compound that exhibits high absorption in the long wavelength region of 365 nm or greater and exhibits high sensitivity in the long wavelength region of 365 nm or greater, excelling in solubility in organic solvents; an acid generator consisting of the compound; a chemical amplification type photoresist composition containing the acid generator; and making use of the chemical amplification type photoresist composition, a resist layer laminate and method of forming a resist pattern. The compound is any of those represented by the general formula (B1). In the formula (B1), at least one of R1, R2 and R3 is any of groups of the formula (B1a). In the formula (B1a), Y is a group of aromatic ring devoid of two hydrogen atoms, the aromatic ring optionally having a substituent; Z is a group of aromatic ring devoid of one hydrogen atom, the aromatic ring optionally having a substituent; and the aromatic ring of at least one of Y and Z has at least one alkoxy.
Inventors:
SAITO KOJI (JP)
HADA HIDEO (JP)
WASHIO YASUSHI (JP)
HADA HIDEO (JP)
WASHIO YASUSHI (JP)
Application Number:
PCT/JP2006/320779
Publication Date:
April 26, 2007
Filing Date:
October 18, 2006
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
SAITO KOJI (JP)
HADA HIDEO (JP)
WASHIO YASUSHI (JP)
SAITO KOJI (JP)
HADA HIDEO (JP)
WASHIO YASUSHI (JP)
International Classes:
C07C381/12; C07C309/04; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| WO2004029037A1 | 2004-04-08 |
Foreign References:
| JP2005187799A | 2005-07-14 | |||
| JPH107649A | 1998-01-13 |
Attorney, Agent or Firm:
TANAI, Sumio et al. (Yaesu Chuo-ku Tokyo, 53, JP)
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