Title:
NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR
Document Type and Number:
WIPO Patent Application WO/2017/099130
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1) (wherein R1 to R6 independently represent a hydrogen atom, a hydroxy group, an alkoxy group, an organic group other than the aforementioned substituents, or the like; X represents a residue having a structure such that n hydrogen atoms are removed from a saturated hydrocarbon containing a ring structure; and n represents an integer of 1 to 6).
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Inventors:
TERADA KIWAMU (JP)
YAMAMOTO KAZUYOSHI (JP)
ARIMITSU KOJI (JP)
YAMAMOTO KAZUYOSHI (JP)
ARIMITSU KOJI (JP)
Application Number:
PCT/JP2016/086401
Publication Date:
June 15, 2017
Filing Date:
December 07, 2016
Export Citation:
Assignee:
UNIV TOKYO SCIENCE FOUND (JP)
NIPPONKAYAKU KK (JP)
NIPPONKAYAKU KK (JP)
International Classes:
C07C271/24; C07C271/12; C08F2/50; C09D7/12
Domestic Patent References:
| WO2002092718A1 | 2002-11-21 |
Foreign References:
| JP2012082247A | 2012-04-26 | |||
| JP2004163764A | 2004-06-10 | |||
| JP2004163765A | 2004-06-10 | |||
| JP2004163766A | 2004-06-10 | |||
| JP2006023580A | 2006-01-26 | |||
| JP2006023581A | 2006-01-26 | |||
| JP2006023582A | 2006-01-26 | |||
| JP2012181510A | 2012-09-20 | |||
| JP2012018197A | 2012-01-26 | |||
| JP2012018198A | 2012-01-26 |
Attorney, Agent or Firm:
KAMIMURA Yoichiro (JP)
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