Title:
NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR CONTAINING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR
Document Type and Number:
WIPO Patent Application WO/2019/168113
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a novel compound which has excellent solvent solubility and compatibility with a resin, and which can generate bases and radicals with high efficiency by being irradiated with active energy rays; a photopolymerization initiator which contains said novel compound; and a photosensitive resin composition which contains said photopolymerization initiator and from which a cured product can be obtained that has high sensitivity and no metal corrosion. This novel compound is represented by formula (1). (In formula (1), R1, R2, R3, R5 and R6 represent a hydroxyl group or an alkoxy group. The R4's independently represent an organic group containing a thioether bond. R7 and R9 independently represent a hydrogen atom or an alkyl group with 1 to 4 carbons. R8 represents an alkylene group or an arylene group. X represents an oxygen atom or a sulfur atom.)
Inventors:
TERADA KIWAMU (JP)
KUWABARA HIROKAZU (JP)
KUWABARA HIROKAZU (JP)
Application Number:
PCT/JP2019/007888
Publication Date:
September 06, 2019
Filing Date:
February 28, 2019
Export Citation:
Assignee:
NIPPON KAYAKU KK (JP)
International Classes:
C07C323/22; C08F2/50; C08F20/36
Domestic Patent References:
| WO2017099130A1 | 2017-06-15 | |||
| WO2002092718A1 | 2002-11-21 | |||
| WO2012132558A1 | 2012-10-04 | |||
| WO2012052288A1 | 2012-04-26 | |||
| WO2018207836A1 | 2018-11-15 |
Foreign References:
| KR20130066483A | 2013-06-20 | |||
| JP2002265531A | 2002-09-18 | |||
| KR20060053095A | 2006-05-19 | |||
| JP2014098763A | 2014-05-29 |
Other References:
TERADA, TSUTOMU ET AL.: "UV Hard Coat Material Using Benzoin Derivative Generating Amine and Radical as a Photobase Generator", POLYMER PREPRINTS, vol. 66, no. 2, 2017, Japan
TERADA, TSUTOMU ET AL.: "Development of photobase generator generating amine and radical and its application to hard coat material", POLYMER PREPRINTS, vol. 66, 2017, Japan
ISHIKAWA, N. ET AL.: "Photosensitivity Characteristics of UV Curable Organic-Inorganic Hybrids Sensitized with Benzoin Derivatives as Photobase Generators", JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, vol. 27, no. 2, 2014, pages 223 - 225, XP055585977, doi:10.2494/photopolymer.27.223
TERADA, TSUTOMU ET AL.: "Development of photobase generator generating amine and radical and its application to hard coat material", POLYMER PREPRINTS, vol. 66, 2017, Japan
ISHIKAWA, N. ET AL.: "Photosensitivity Characteristics of UV Curable Organic-Inorganic Hybrids Sensitized with Benzoin Derivatives as Photobase Generators", JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, vol. 27, no. 2, 2014, pages 223 - 225, XP055585977, doi:10.2494/photopolymer.27.223
Attorney, Agent or Firm:
KAMIMURA Yoichiro (JP)
Download PDF: