NOVEL COMPOUND, POLYMER COMPOUND, RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Title:

NOVEL COMPOUND, POLYMER COMPOUND, RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Document Type and Number:

WIPO Patent Application WO/2006/011420

Kind Code:

A1

Abstract:

Disclosed is a compound represented by the general formula (1) below. (1) [In the formula, R represents a hydrogen atom or a lower alkyl group; X represents a sulfur atom or an oxygen atom; Y represents a chain, branched or cyclic alkyl group having 1-20 carbon atoms wherein a part of hydrogen atoms may be substituted by a group containing a heteroatom or such an alkyl group wherein a part of carbon atoms is substituted by a heteroatom.]

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Inventors:

SHIONO DAIJU (JP)
MATSUMARU SYOGO (JP)
HADA HIDEO (JP)

Application Number:

PCT/JP2005/013473

Publication Date:

February 02, 2006

Filing Date:

July 22, 2005

Export Citation:

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Assignee:

TOKYO OHKA KOGYO CO LTD (JP)
SHIONO DAIJU (JP)
MATSUMARU SYOGO (JP)
HADA HIDEO (JP)

International Classes:

C07C233/61; C07C275/48; C07C335/26; C08F20/54; G03F7/039; H01L21/027; (IPC1-7): C08F20/54; C07C233/61; C07C275/48; C07C335/26; G03F7/039; H01L21/027

Domestic Patent References:

WO2002016454A1

2002-02-28

Foreign References:

JPH11255831A	1999-09-21
JPH10316643A	1998-12-02
JPH10175938A	1998-06-30
JPS6346203A	1988-02-27
JPS61272208A	1986-12-02

Attorney, Agent or Firm:

Tanai, Sumio (Yaesu Chuo-ku, Tokyo 53, JP)

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