Title:
NOVEL COMPOUND AND USE THEREOF
Document Type and Number:
WIPO Patent Application WO/2011/135673
Kind Code:
A1
Abstract:
Provided is a copper plating technique that enables the filing of high aspect-ratio via-holes and through-holes in semiconductor substrates such as silicon substrates, organic material substrates and ceramic substrates. The disclosed technique involves a copper plating method, a copper plating bath and copper plating additives that include a tertiary amine compound represented by general formula 1 (wherein the R1 moiety is a C2 - C30 glycol ether represented, the R2 moieties are hydrocarbons that form 5-membered rings, 6-membered rings or a 5- and a 6-membered ring and the R2 moieties may include a C3 - C8 unsaturated bond and may be substituted with nitrogen atoms or oxygen atoms) and/or a quaternary amine compound thereof.
Inventors:
YASUDA HIROKI (JP)
KIMIZUKA RYOICHI (JP)
TAKASU TATSUJI (JP)
SATO TAKURO (JP)
ISHIZUKA HIROSHI (JP)
OGO YASUHIRO (JP)
OYAMA YUTO (JP)
TONOOKA YU (JP)
KOSAKA MIKIKO (JP)
SHIMOMURA AYA (JP)
SHIMIZU YUMIKO (JP)
KIMIZUKA RYOICHI (JP)
TAKASU TATSUJI (JP)
SATO TAKURO (JP)
ISHIZUKA HIROSHI (JP)
OGO YASUHIRO (JP)
OYAMA YUTO (JP)
TONOOKA YU (JP)
KOSAKA MIKIKO (JP)
SHIMOMURA AYA (JP)
SHIMIZU YUMIKO (JP)
Application Number:
PCT/JP2010/057474
Publication Date:
November 03, 2011
Filing Date:
April 27, 2010
Export Citation:
Assignee:
EBARA UDYLITE KK (JP)
YASUDA HIROKI (JP)
KIMIZUKA RYOICHI (JP)
TAKASU TATSUJI (JP)
SATO TAKURO (JP)
ISHIZUKA HIROSHI (JP)
OGO YASUHIRO (JP)
OYAMA YUTO (JP)
TONOOKA YU (JP)
KOSAKA MIKIKO (JP)
SHIMOMURA AYA (JP)
SHIMIZU YUMIKO (JP)
YASUDA HIROKI (JP)
KIMIZUKA RYOICHI (JP)
TAKASU TATSUJI (JP)
SATO TAKURO (JP)
ISHIZUKA HIROSHI (JP)
OGO YASUHIRO (JP)
OYAMA YUTO (JP)
TONOOKA YU (JP)
KOSAKA MIKIKO (JP)
SHIMOMURA AYA (JP)
SHIMIZU YUMIKO (JP)
International Classes:
C25D3/38; C07D295/08; C25D7/00; C25D7/12
Domestic Patent References:
| WO2002090623A1 | 2002-11-14 |
Foreign References:
| JP2007031834A | 2007-02-08 | |||
| JPS61174268A | 1986-08-05 | |||
| JPS4642072B1 | ||||
| JPS62224954A | 1987-10-02 | |||
| JPS4843136B1 | 1973-12-17 | |||
| JPS5253426A | 1977-04-30 | |||
| JP2007107074A | 2007-04-26 | |||
| JP2006057177A | 2006-03-02 | |||
| JP2007146285A | 2007-06-14 | |||
| JP2004137588A | 2004-05-13 |
Other References:
V. PETROW ET AL.: "Some hydroxyalkyl ethers of o-toloxy- and p-chlorophenoxypropane-2,3-diol", JOURNAL OF PHARMACY AND PHARMACOLOGY, vol. 7, 1955, pages 198 - 203
I. YA. NIKONOVA ET AL.: "Stability of polyol compositions for preparation of rigid polyurethane foams", PLASTICHESKIE MASSY, no. 143, 1990, pages 58 - 61
I. YA. NIKONOVA ET AL.: "Stability of polyol compositions for preparation of rigid polyurethane foams", PLASTICHESKIE MASSY, no. 143, 1990, pages 58 - 61
Attorney, Agent or Firm:
The Patent Corporate body of Ono & Co. (JP)
Patent business corporation Ono international patent firm (JP)
Patent business corporation Ono international patent firm (JP)
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