NOVEL PROCESS FOR PREPARING RESISTS

Title:

NOVEL PROCESS FOR PREPARING RESISTS

Document Type and Number:

WIPO Patent Application WO/1999/015935

Kind Code:

A1

Abstract:

A resist composition is prepared by reacting an alkali-soluble polymer having phenolic hydroxyl or carboxyl groups with a vinyl ether compound in an aprotic solvent, such as propylene glycol monomethyl ether acetate, in the presence of an acid catalyst, suspending the reaction by the addition of a base, and directly adding a photoacid generator to the reaction solution. When a dialkyl dicarbonate is used instead of the vinyl ether compound, a resist composition is prepared by carrying out the reaction in the presence of a base catalyst and adding a photoacid generator directly to the reaction solution. Thus resist compositions can be prepared without isolating or purifying an alkali-soluble polymer which has been substituted by a catalytic reaction.

Inventors:

OKAZAKI HIROSHI (JP)
PAWLOWSKI GEORG (JP)
FUNATO SATORU (JP)
KINOSHITA YOSHIAKI (JP)
YAMAGUCHI YUKO (JP)

Application Number:

PCT/JP1998/003788

Publication Date:

April 01, 1999

Filing Date:

August 26, 1998

Export Citation:

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Assignee:

CLARIANT INT LTD (CH)
OKAZAKI HIROSHI (JP)
PAWLOWSKI GEORG (JP)
FUNATO SATORU (JP)
KINOSHITA YOSHIAKI (JP)
YAMAGUCHI YUKO (JP)

International Classes:

C08F8/00; C08F212/14; C08F257/02; C08L25/18; C09D125/18; G03F7/039; G03F7/004; (IPC1-7): G03F7/039; C08F212/14; C08L25/18; C09D125/18

Foreign References:

JPH08231638A	1996-09-10
JPH0219846A	1990-01-23
JPH0218564A	1990-01-22
JPH05249682A	1993-09-28
JPH07140666A	1995-06-02
JPH0815864A	1996-01-19
JPH096003A	1997-01-10
JPH1073923A	1998-03-17

Other References: