Title:
NOVOLAK TYPE RESIN AND RESIST MATERIAL
Document Type and Number:
WIPO Patent Application WO/2017/179385
Kind Code:
A1
Abstract:
Provided are: a novolak type resin excellent in terms of various performances including heat resistance, alkali developability, photosensitivity, and resolution; a photosensitive composition which contains the novolak type resin; a curable composition containing the novolak type resin, and a cured object obtained from the curable composition; and a resist material which comprises the photosensitive composition or curable composition. The novolak type resin is obtained from starting reactant materials indispensably comprising a compound (A) having a tris(hydroxyaryl)methine group and an aldehyde compound (B). The photosensitive composition contains the novolak type resin. The curable composition contains the novolak type resin. The cured object is obtained from the curable composition. The resist material comprises the photosensitive composition or curable composition.
Inventors:
IMADA TOMOYUKI (JP)
SATO YUSUKE (JP)
SATO YUSUKE (JP)
Application Number:
PCT/JP2017/011647
Publication Date:
October 19, 2017
Filing Date:
March 23, 2017
Export Citation:
Assignee:
DAINIPPON INK & CHEMICALS (JP)
International Classes:
C08G8/20; C08L61/08; G03F7/023; G03F7/20
Domestic Patent References:
| WO2004066030A2 | 2004-08-05 |
Foreign References:
| EP2368925A1 | 2011-09-28 | |||
| JP2010128002A | 2010-06-10 | |||
| JP2001207028A | 2001-07-31 | |||
| JPH06348006A | 1994-12-22 |
Attorney, Agent or Firm:
KONO Michihiro (JP)
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