Title:
NOZZLE AND NOZZLE HEAD
Document Type and Number:
WIPO Patent Application WO/2013/121102
Kind Code:
A3
Abstract:
The present invention relates to a nozzle (8) and nozzle head (1) arranged to subject a surface of a substrate (100) to gaseous precursors. The nozzle (8) comprises an output face (24) via which the precursor is supplied, a longitudinal precursor supply element (30, 50) for supplying precursor and a longitudinal discharge channel (6) open to and along the output face (24) for discharging at least a fraction of the precursor supplied from the precursor channel (10). The precursor supply element (30, 0) is arranged to extend inside the discharge channel (6) such that the precursor supply element (30, 50) divides the discharge channel (6) in the longitudinal direction to a first discharge sub-channel (7) and a second discharge sub-channel (9) on opposite sides of the precursor supply element (30, 50) for supplying precursor through the discharge channel (6).
Inventors:
ALASAARELA TAPANI (FI)
SOININEN PEKKA (FI)
JAUHIAINEN MIKA (FI)
SOININEN PEKKA (FI)
JAUHIAINEN MIKA (FI)
Application Number:
PCT/FI2013/050154
Publication Date:
October 24, 2013
Filing Date:
February 12, 2013
Export Citation:
Assignee:
BENEQ OY (FI)
International Classes:
C23C16/455; C23C16/00
Domestic Patent References:
| WO2008130369A1 | 2008-10-30 |
Foreign References:
| US20100037820A1 | 2010-02-18 |
Other References:
See also references of EP 2814996A4
Attorney, Agent or Firm:
KOLSTER OY AB (P.O.Box 148, Helsinki, FI)
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