OPTICAL INTEGRATOR, ILLUMINATION OPTICAL DEVICE, PHOTOLITHOGRAPH, PHOTOLITHOGRAPHY, AND METHOD FOR FABRICATING DEVICE

WIPO Patent Application WO/2006/070580

A1

An optical integrator having characteristics suppressing the influence of the relative positioning error of a pair of optical members on the illuminance distribution and the profile of the illuminated field. The wavefront splitting optical integrator (8) comprises a first optical member (8a) and a second optical integrator (8b) arranged sequentially from the light incident side. The first optical member has a plurality of first entrance surfaces (8aa) exhibiting a diffraction power in the first direction (Z direction) but not exhibiting any diffraction power in the second direction (X direction), and a plurality of first exit surfaces (8ab) exhibiting a diffraction power in the first direction but not exhibiting any diffraction power in the second direction. The second optical member has a plurality of second entrance surfaces (8ba) exhibiting a diffraction power in the second but not exhibiting any diffraction power in the first direction, and a plurality of second exit surfaces (8bb) exhibiting a diffraction power in the second direction but not exhibiting any diffraction power in the first direction.

JP5576537	A lithography device and a device manufacturing method
JP3500119	HOT PLATE UNIT
JPS561450	HIGH POWER XXRAY SOURCE

KITA NAONORI (JP)

PCT/JP2005/022612

July 06, 2006

December 09, 2005

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NIKON CORP (JP)
KITA NAONORI (JP)

H01L21/027; G02B19/00; G03F7/20

JPH07174974A	1995-07-14
JPH05134230A	1993-05-28
JP2004198748A	2004-07-15

See also references of EP 1837895A4
None

Yamaguchi, Takao (10 Kanda-tsukasacho 2-chome, Chiyoda-k, Tokyo 48, JP)

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