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Patent Searching and Data


Title:
OPTICAL PROCESSING DEVICE AND OPTICAL PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2016/125433
Kind Code:
A1
Abstract:
In the present invention, disclosed are an optical processing device and method for suppressing any processing unevenness within a substrate. An optical processing device (100) is provided with a light source unit (10) that produces light and a processing unit (20) in which an object to be processed is exposed to the light produced by the light source unit (10). The processing unit (20) is provided with: a processing region (R1) in which the object to be processed is retained and is exposed to the light in a processing gas atmosphere; and a preparatory region (R2) through which the processing gas passes while being exposed to the light before proceeding towards the processing region, and in which the object to be processed is prohibited from being placed.

Inventors:
MARUYAMA SHUN (JP)
HORIBE HIROKI (JP)
HABU TOMOYUKI (JP)
ENDO SHINICHI (JP)
AIBA AKIRA (JP)
MIURA MASAKI (JP)
Application Number:
PCT/JP2016/000226
Publication Date:
August 11, 2016
Filing Date:
January 18, 2016
Export Citation:
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Assignee:
USHIO ELECTRIC INC (JP)
International Classes:
H05K3/42; G03F7/42; H01L21/027; H01L21/304; H01L21/683
Domestic Patent References:
WO2014104154A12014-07-03
Foreign References:
JPS6320833A1988-01-28
JPS6236668A1987-02-17
Attorney, Agent or Firm:
KONISHI, Kay et al. (JP)
Megumi Konishi (JP)
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