Title:
OPTICAL SYSTEM FOR PERFORMING PHOTOLITHOGRAPHY USING DYNAMIC MASK AND METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2021/133112
Kind Code:
A1
Abstract:
The present invention provides an optical system for performing photolithography, the optical system comprising: a light source which emits light of a first wavelength and light of a second wavelength, the first and second wavelengths being different from each other; a dynamic mask which reflects light incident thereupon from the light source and includes two-dimensionally arranged micromirrors; a substrate on which an image is formed by the light reflected from the dynamic mask, and which is coated with a photoresist that undergoes no photochemical reaction with the light of the first wavelength while undergoing a photochemical reaction with the light of the second wavelength; a stage on which the substrate is mounted and which is vertically movable; and an image-capturing unit which displays an image formed on a photoresist surface on the substrate, wherein the image formed on the photoresist surface with the light of the first wavelength is used to align the focus of an optical unit including a path from the dynamic mask to the substrate while vertically moving the stage, and the light of the second wavelength is reflected by the dynamic mask and exposed to light on the photoresist surface, thereby being used to perform photolithography.
Inventors:
JEON HEON SU (KR)
KANG MIN SU (KR)
KANG MIN SU (KR)
Application Number:
PCT/KR2020/019126
Publication Date:
July 01, 2021
Filing Date:
December 24, 2020
Export Citation:
Assignee:
SEOUL NAT UNIV R&DB FOUNDATION (KR)
International Classes:
G03F9/00; G03F7/20
Foreign References:
| CN108227407A | 2018-06-29 | |||
| KR20170020250A | 2017-02-22 | |||
| US20180217501A1 | 2018-08-02 | |||
| KR20060102270A | 2006-09-27 | |||
| KR20080021497A | 2008-03-07 |
Attorney, Agent or Firm:
THE WAVE IP LAW FIRM (KR)
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