ORGANIC COMPOUND FOR CVD RAW MATERIAL AND PROCESS FOR PRODUCING THIN FILM OF METAL OR METAL COMPOUND WITH THE USE OF ORGANIC COMPOUND

WIPO Patent Application WO/2004/024980

A1

An organic compound for CVD raw material, comprising a first organometallic compound having a metal atom coordinating with ligands and, mixed therewith, at least one second organometallic compound comprising as a center atom the same metal atom as in the first organometallic compound, the center atom coordinating with different ligands, which second organometallic compound exhibits decomposition behavior different from that of the fist organometallic compound. In particular, raw material for CVD realizing characteristics of handling easiness and thin film adherence whose simultaneous achievement has been difficult can be produced by selecting a cyclopentadiene complex or derivative thereof as the first organometallic compound and selecting a β-diketonate compound as the second organometallic compound and by mixing these.

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SAITO MASAYUKI (JP)

PCT/JP2003/009861

March 25, 2004

August 04, 2003

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TANAKA PRECIOUS METAL IND (JP)
SAITO MASAYUKI (JP)

C07C49/92; C07F1/10; C07F1/12; C07F15/00; C07F17/00; C07F17/02; C23C16/18; C23C16/448; (IPC1-7): C23C16/18; C07C49/92

WO1998000432A1

1998-01-08

JPH10324970A

1998-12-08

Tanaka, Daisuke (15-2 Hongo 1-chom, Bunkyo-ku Tokyo, JP)

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