Title:
ORGANIC FILM FORMATION DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/117250
Kind Code:
A1
Abstract:
This organic film formation device according to one embodiment is provided with: a chamber in which an atmosphere that has been depressurized to below atmospheric pressure can be maintained; at least one treatment compartment that is provided to the interior of the chamber and is enclosed by a cover; and an exhaust unit that makes it possible to exhaust air out of the interior of the chamber. Provided to the treatment compartment are: an upper heating unit having at least one first heater; a lower heating unit that has at least one second heater and stands opposite the upper heating unit; and a workpiece support section that can support, between the upper heating unit and the lower heating unit, a workpiece that comprises a substrate and a solution that contains organic material and a solvent and that has been applied to an upper surface of the substrate. The treatment compartment comprises a space communicated with the chamber. The exhaust unit depressurizes the interior of the chamber, and also depressurizes a space between an inner wall of the chamber and the cover.
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| JPH09133466 | NOISTUREPROOFING STORAGE CHAMBER |
Inventors:
NISHIBE YUKINOBU (JP)
ISO AKINORI (JP)
OOMORI KEIGO (JP)
TAKAHASHI TAKASHI (JP)
ISO AKINORI (JP)
OOMORI KEIGO (JP)
TAKAHASHI TAKASHI (JP)
Application Number:
PCT/JP2018/045879
Publication Date:
June 20, 2019
Filing Date:
December 13, 2018
Export Citation:
Assignee:
SHIBAURA MECHATRONICS CORP (JP)
International Classes:
F26B9/06; F26B3/30; F26B25/10; F27B17/00; F27D7/06; G02F1/13; G02F1/1337
Foreign References:
| JP2017083140A | 2017-05-18 | |||
| JP2016223733A | 2016-12-28 | |||
| JP2001118852A | 2001-04-27 | |||
| JPH01154515A | 1989-06-16 | |||
| JP2002195755A | 2002-07-10 | |||
| JPS6280199U | 1987-05-22 |
Attorney, Agent or Firm:
HYUGAJI, Masahiko et al. (JP)
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