Title:
ORGANIC SOLVENT SOL OF AMINE-CONTAINING HOLLOW SILICA PARTICLES, AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2024/071033
Kind Code:
A1
Abstract:
[Problem] To provide: an organic solvent sol of hollow silica particles, in which the sol contains an amine, the hollow silica particles have a specific surface charge, exhibit high dispersibility in a resin, and have a space inside an outer shell; a method for producing same; and a film-forming composition. [Solution] Provided is an organic solvent sol of hollow silica particles, in which the sol contains an amine and the hollow silica particles have a space inside an outer shell. The amine is at least one type of amine selected from among a primary amine, secondary amine and tertiary amine having a total of 1-10 carbon atoms. The water solubility of the amine is 80 g/L or more. The content of the amine is 0.001-10 mass% relative to SiO2 in the hollow silica particles. The average particle diameter of the hollow silica particles, as measured using a dynamic light-scattering method, is 20-150 nm. The surface charge amount is 5-250 μeq/g, as calculated per 1 g of SiO2 in the hollow silica particles. The organic solvent is an alcohol, ketone, ether or ester having 1-10 carbon atoms. Also provided is a film-forming composition that contains the organic solvent sol of hollow silica particles and an organic resin.
Inventors:
NISHIMURA TOHRU (JP)
YAMADA SHUHEI (JP)
HIDA MASAHIRO (JP)
YAMADA SHUHEI (JP)
HIDA MASAHIRO (JP)
Application Number:
PCT/JP2023/034712
Publication Date:
April 04, 2024
Filing Date:
September 25, 2023
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C01B33/18; C08F292/00; G02B1/111; G02B1/113
Domestic Patent References:
WO2014199904A1 | 2014-12-18 | |||
WO2016181997A1 | 2016-11-17 | |||
WO2018186468A1 | 2018-10-11 |
Foreign References:
JP2010503693A | 2010-02-04 | |||
JP2020059624A | 2020-04-16 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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