Title:
OVERLAY PATTERN
Document Type and Number:
WIPO Patent Application WO/2022/033196
Kind Code:
A1
Abstract:
An overlay pattern, comprising: a light-transmitting region, and a first non-light-transmitting region. The first non-light-transmitting region and the light-transmitting region are located in the same plane, and the area of the first non-light-transmitting region is greater than the area of the light-transmitting region, wherein an orthographic projection of the first non-light-transmitting region in the plane and an orthographic projection of the light-transmitting region in the plane do not overlap, and constitute a first rectangular region (100).
Inventors:
WANG MEI-LI (CN)
Application Number:
PCT/CN2021/102339
Publication Date:
February 17, 2022
Filing Date:
June 25, 2021
Export Citation:
Assignee:
CHANGXIN MEMORY TECH INC (CN)
International Classes:
H01L21/00; G03F1/38
Foreign References:
| CN1854892A | 2006-11-01 | |||
| CN107167937A | 2017-09-15 | |||
| CN104570588A | 2015-04-29 | |||
| CN209044299U | 2019-06-28 | |||
| CN105759564A | 2016-07-13 | |||
| US7512928B2 | 2009-03-31 |
Attorney, Agent or Firm:
ADVANCE CHINA IP LAW OFFICE (CN)
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