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Title:
OXYGEN RADICAL SUPPLY DEVICE AND OXYGEN RADICAL SUPPLY METHOD
Document Type and Number:
WIPO Patent Application WO/2021/205594
Kind Code:
A1
Abstract:
Provided is an oxygen radical supply device capable of efficiently injecting oxygen radicals into treated water.　The oxygen radical supply device (3) is equipped with a water supply unit (61) for supplying water, a water discharge unit (65) for discharging treated water, and an oxygen radical supply mechanism (7) for adding oxygen radicals to the water supplied from the water supply unit between the water supply unit and the water discharge unit from an intersecting direction that intersects the water flow direction from the water supply unit toward the water discharge unit.

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Inventors:
KUZUMOTO MASAKI (JP)
SHIOTA ARUFA (JP)
NAITO TERUKI (JP)
Application Number:
PCT/JP2020/015952
Publication Date:
October 14, 2021
Filing Date:
April 09, 2020
Export Citation:
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Assignee:
MITSUBISHI ELECTRIC CORP (JP)
International Classes:
C01B13/11; B01J19/08; C02F1/50; C02F1/72
Foreign References:
JP2015054277A2015-03-23
JPH02157091A1990-06-15
JP2015077565A2015-04-23
JPH04135694A1992-05-11
Attorney, Agent or Firm:
PALMO PATENT FIRM, P.C. (JP)
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