Title:
PARTICLE ANALYSIS DEVICE AND PARTICLE ANALYSIS METHOD
Document Type and Number:
WIPO Patent Application WO/2022/254620
Kind Code:
A1
Abstract:
In a particle analysis device of the present invention that analyzes one or more particles, the particle analysis device can operate in any of a plurality of operating patterns, the plurality of operating patterns including: a first operating pattern in which after an image of one or more particles prepared at a first time is acquired at a first magnification, a determination is made of whether the shape of a single particle meets a first standard; a second operating pattern that, after an image of a plurality of particles prepared at the first time is acquired, determines whether the brightness and area of the plurality of particles meets a second standard; and a third operating pattern that, after acquiring an image of a plurality of particles prepared at a second time longer than the first time at a second magnification lower than the first magnification, determines whether the number of the plurality of particles meets a third standard.
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Inventors:
MATSUMOTO ERINO (JP)
HISADA AKIKO (JP)
OOMINAMI YUUSUKE (JP)
HIRANO RYO (JP)
HISADA AKIKO (JP)
OOMINAMI YUUSUKE (JP)
HIRANO RYO (JP)
Application Number:
PCT/JP2021/021042
Publication Date:
December 08, 2022
Filing Date:
June 02, 2021
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/22; H01J37/28
Foreign References:
| JP2019087369A | 2019-06-06 | |||
| JP2006269489A | 2006-10-05 | |||
| JP2007026885A | 2007-02-01 | |||
| US20200075287A1 | 2020-03-05 |
Attorney, Agent or Firm:
HIRAKI & ASSOCIATES (JP)
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