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Patent Searching and Data


Title:
PARTICLE CORRECTOR AND PARTICLE SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/197099
Kind Code:
A1
Abstract:
A particle corrector and a particle system, which relate to the technical field of particles, and are used for solving the problems of the particle beam current being relatively low, the resolution being low, the particle beam quality being poor, etc. The particle corrector comprises: a first beam-splitting plate (31) and a correction plate assembly (32), wherein the first beam-splitting plate (31) is provided with M beam-splitting holes (311); and the correction plate assembly (32) comprises N correction plates (321, 322, 323), which are arranged in a stacked manner. Each correction plate (321, 322, 323) has M through holes (320) and M electrode assemblies; the M beam-splitting holes (311) are arranged corresponding to the M through holes (320) on a one-to-one basis; the M electrode assemblies are arranged corresponding to the M through holes (320) on a one-to-one basis; and each electrode assembly is used for generating, in the corresponding through hole (320), an electric field which is used for correcting a particle beam, wherein M is an integer greater than or equal to 1, and N is an integer greater than or equal to 1. In the particle corrector, the particle beam flow and the particle beam quality can be effectively improved; in addition, the flexibility and the application range of the particle corrector can be improved.

Inventors:
MA ZE (CN)
HE JIAKUN (CN)
ZHANG WEN (CN)
ZHAO CHONG (CN)
ZHANG CHAO (CN)
Application Number:
PCT/CN2022/086035
Publication Date:
October 19, 2023
Filing Date:
April 11, 2022
Export Citation:
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Assignee:
HUAWEI TECH CO LTD (CN)
International Classes:
H01J37/317; H01J37/147
Domestic Patent References:
WO2021180365A12021-09-16
Foreign References:
CN103620693A2014-03-05
US20190259575A12019-08-22
CN113169017A2021-07-23
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