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Patent Searching and Data


Title:
PASSIVATING OVERCOAT BILAYER
Document Type and Number:
WIPO Patent Application WO2003005377
Kind Code:
A3
Abstract:
A new capping multilayer structure for EUV-reflective Mo/Si multilayers consists of two layers: A top layer that protects the multilayer structure from the environment and a bottom layer that acts as a diffusion barrier between the top layer and the structure beneath. One embodiment combines a first layer of Ru with a second layer of B4C. Another embodiment combines a first layer of Ru with a second layer of Mo. These embodiments have the additional advantage that the reflectivity is also enhanced. Ru has the best oxidation resistance of all materials investigated so far. B4C is an excellent barrier against silicide formation while the silicide layer formed at the Si boundary is well controlled.

Inventors:
BAJT SASA
FOLTA JAMES A
SPILLER EBERHARD A
Application Number:
PCT/US2002/021128
Publication Date:
October 30, 2003
Filing Date:
July 02, 2002
Export Citation:
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Assignee:
UNIV CALIFORNIA (US)
International Classes:
G02B1/10; G02B5/08; G21K1/06; H01L21/027; (IPC1-7): G21K1/06; G02B5/28; G02B1/10
Domestic Patent References:
WO2002059905A22002-08-01
WO2002054115A22002-07-11
WO2000073823A12000-12-07
Foreign References:
EP1150139A22001-10-31
EP1065568A22001-01-03
US5958605A1999-09-28
US6229652B12001-05-08
Other References:
TAKENAKA H ET AL: "HEAT-RESISTANCE OF MO/SI MULTILAYER EUV MIRRORS WITH INTERLEAVED CARBON BARRIER-LAYERS", OSA TRENDS IN OPTICS AND PHOTONICS, WASHINGTON, DC, US, vol. 4, 1 May 1996 (1996-05-01), pages 169 - 172, XP008007480, ISSN: 1094-5695
MONTCALM C ET AL: "MULTILAYER REFLECTIVE COATINGS FOR EXTREME-ULTRAVIOLET LITHOGRAPHY", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 3331, February 1998 (1998-02-01), pages 42 - 51, XP000908927
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