PATTERN HEIGHT MEASUREMENT DEVICE AND CHARGED PARTICLE BEAM DEVICE

WIPO Patent Application WO/2016/016957

A1

The purpose of the present invention is to provide: a pattern height measurement device capable of high-precision measurement of the dimensions of a fine pattern, in the height direction; and a charged particle beam device.　In order to achieve said purpose, this pattern height measurement device comprises a calculation device that finds the dimensions of a sample, in the height direction, on the basis of first reflected light information obtained by scattering light that is reflected when light is irradiated on to the sample. The calculation device: finds second reflected light information on the basis of a formula for the relationship between the value for the dimension in the sample surface direction of a pattern formed upon the sample, obtained by irradiation of a charged particle beam on the sample, the value for the dimension in the height direction of the sample, and reflected light information; compares a second reflected light intensity and the first reflected light information; and outputs, as the dimension in the height direction of the pattern, the value for the dimension in the height direction of the sample in the second reflected light information when the first reflected light information and the second reflected light information fulfil prescribed conditions.

KAWADA HIROKI (JP)
SASADA KATSUHIRO (JP)
HIROSE TAKENORI (JP)
TAKAMI SHOU (JP)

PCT/JP2014/069991

February 04, 2016

July 30, 2014

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HITACHI HIGH TECH CORP (JP)

G01B11/02; G01B15/00

JP2009150832A	2009-07-09
JP2011027461A	2011-02-10
JP2002093870A	2002-03-29

INOUE Manabu et al. (JP)
Manabu Inoue (JP)

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