Title:
PATTERN INSPECTING SYSTEM AND PATTERN INSPECTING METHOD
Document Type and Number:
WIPO Patent Application WO/2007/102421
Kind Code:
A1
Abstract:
[PROBLEMS] To provide a pattern inspecting system and a pattern inspecting method by
which a time required for inspecting a pattern formed on a sample can be shortened and
accurate inspection can be performed. [MEANS FOR SOLVING PROBLEMS] A pattern inspecting
system is composed of a CAD system and a pattern length measuring apparatus which
can communicate each other. The CAD system is composed of a CAD storage section, an
information inputting section, a data generating section for generating set-up
data by extracting pattern designing information of a pattern included in a specified
range to be inspected from the CAD storage section, a CAD control section and a
CAD communication section. The pattern length measuring apparatus is composed
of a storage section, an automatic measuring data generating section for generating
automatic measuring data for performing automatic measurement, a length measuring
section for performing automatic focusing and automatically measuring the
length of the pattern, a control section and a communicating section. The control
section controls the length measuring section to perform automatic focusing
within a range specified by the automatic measuring section and then to perform
automatic measurement of the pattern length.
Inventors:
SHIDA SOICHI (JP)
Application Number:
PCT/JP2007/054015
Publication Date:
September 13, 2007
Filing Date:
March 02, 2007
Export Citation:
Assignee:
ADVANTEST CORP (JP)
SHIDA SOICHI (JP)
SHIDA SOICHI (JP)
International Classes:
G01B15/00; G01N23/225; H01J37/21
Foreign References:
JP2000236007A | 2000-08-29 | |||
JPS6454305A | 1989-03-01 | |||
JP2004031709A | 2004-01-29 | |||
JP2002328015A | 2002-11-15 | |||
JP2006351746A | 2006-12-28 |
Attorney, Agent or Firm:
OKAMOTO, Keizo (4F 11-7 Nihonbashi Ningyo-cho 3-chome, Chuo-k, Tokyo 13, JP)
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