PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD

WIPO Patent Application WO/2012/169423

A1

In order for an exterior inspection of a substrate to be performed effectively, an inspection device (100) for performing an exterior inspection of a substrate (10) is provided with a camera (20) for capturing an image of a pattern (12) formed on the surface of the substrate (10), and a control device (32) for controlling the camera (20). The control device (32) is connected to a storage device (34) in which an image processing program (35) for processing the image data captured by the camera (20) is stored, and the control device (32) is connected to a brightness data calculation device (36) for calculating brightness data on the basis of the image data captured by the camera (20). The control device (32) is connected to a resolution altering device (38) which can alter the resolution of the brightness data calculated by the brightness data calculation device (36), and the image processing program (35) comprises a function for determining whether or not a defect is included in the pattern, on the basis of the brightness data at the resolution altered by the resolution altering device (38).

NAKATANI TOMOCHIKA (JP)
TAMAKI KAZUYA (JP)

PCT/JP2012/064101

December 13, 2012

May 31, 2012

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SHARP KK (JP)
NAKATANI TOMOCHIKA (JP)
TAMAKI KAZUYA (JP)

G01N21/956; G06T1/00

JP2003240732A	2003-08-27
JP2004279239A	2004-10-07
JP2008020235A	2008-01-31
JP2008164565A	2008-07-17
JPH08122726A	1996-05-17
JP2005164565A	2005-06-23
JP2006329964A	2006-12-07
JP2004294290A	2004-10-21

TESHIMA MASARU (JP)
Masaru Tejima (JP)

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