Title:
PATTERN RENDERING DEVICE AND PATTERN RENDERING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/150996
Kind Code:
A1
Abstract:
In this pattern rendering method a pattern is rendered on a substrate (P) by causing the substrate (P) to move in a sub-scanning direction while a rendering beam (LBn) modulated to be on or off in accordance with the pattern is scanned across the substrate (P) in a main scanning direction by means of a polygon mirror (PM). In the pattern rendering method, an actual integrated value (FXn) obtained by integrating a photoelectric signal (SS1) during at least one scan of the rendering beam (LBn) in the main scanning direction is measured, where the photoelectric signal (SS1) is output to correspond to the intensity of the rendering beam (LBn) in the ON state, from a photoelectric sensor (SM1d) which receives the rendering beam (LBn) prior to entering the polygon mirror (PM). Furthermore, the intensity of the rendering beam (LBn) in the ON state is adjusted on the basis of a difference between the actual integrated value (FXn) and a target integrated value determined in advance in accordance with the product of an appropriate intensity to which the rendering beam (LBn) should be set when in the ON state, and the number of pixels in the ON state among the total number of pixels aligned in the main scanning direction.
Inventors:
SUZUKI TOMONARI (JP)
ISHIGAKI YUDAI (JP)
ISHIGAKI YUDAI (JP)
Application Number:
PCT/JP2018/004334
Publication Date:
August 23, 2018
Filing Date:
February 08, 2018
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F7/20; B41J2/47; G02B26/10; H04N1/113
Domestic Patent References:
| WO2015166910A1 | 2015-11-05 | |||
| WO2008053915A1 | 2008-05-08 |
Foreign References:
| JP2001267211A | 2001-09-28 | |||
| JP2016206636A | 2016-12-08 | |||
| JP2011123383A | 2011-06-23 | |||
| JPH05260274A | 1993-10-08 |
Attorney, Agent or Firm:
CHIBA Yoshihiro et al. (JP)
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