Title:
PELLICLE FILM COMPRISING MULTI-COMPONENT SILICON COMPOUND LAYER FOR EXTREME ULTRAVIOLET LITHOGRAPHY
Document Type and Number:
WIPO Patent Application WO/2023/085761
Kind Code:
A1
Abstract:
The present invention relates to a pellicle film for extreme ultraviolet lithography. More specifically, the present invention relates to a pellicle film, for extreme ultraviolet lithography, comprising a multi-component silicon compound layer having three or more components. The present invention provides a pellicle film for extreme ultraviolet lithography, the pellicle film comprising a multi-component silicon compound layer having three or more components, the layer comprising: 1) silicon (Si); 2) at least one component selected from Zr, Y, La, Mo, Nb, Ru, W, Ti, Ta, Pt, Hf, Cu, Nd, V, Cr, Mn, Fe, U, Co, Ni, Ce, Th, Pu, Re, Rh, Ir, Pr, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu; and 3) at least one component selected from B, C, O, and N, or at least one component, which is selected from Zr, Y, La, Mo, Nb, Ru, W, Ti, Ta, Pt, Hf, Cu, Nd, V, Cr, Mn, Fe, U, Co, Ni, Ce, Th, Pu, Re, Rh, Ir, Pr, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, and Lu and is different from the component selected in 2).
Inventors:
CHOI JAE HYUCK (KR)
YU LAN (KR)
KIM CHEONG (KR)
CHO SANG JIN (KR)
YU JUN SEONG (KR)
SEO KYOUNG WON (KR)
KIM KYOUNG SOO (KR)
LEE SO YOON (KR)
PARK JIN SU (KR)
MOON SEONG YONG (KR)
YU LAN (KR)
KIM CHEONG (KR)
CHO SANG JIN (KR)
YU JUN SEONG (KR)
SEO KYOUNG WON (KR)
KIM KYOUNG SOO (KR)
LEE SO YOON (KR)
PARK JIN SU (KR)
MOON SEONG YONG (KR)
Application Number:
PCT/KR2022/017536
Publication Date:
May 19, 2023
Filing Date:
November 09, 2022
Export Citation:
Assignee:
FINE SEMITECH CORP (KR)
International Classes:
G03F1/62; G03F1/22
Domestic Patent References:
| WO2021018777A1 | 2021-02-04 |
Foreign References:
| KR102278843B1 | 2021-07-20 | |||
| KR20150145256A | 2015-12-29 | |||
| KR102317053B1 | 2021-10-26 | |||
| KR20200126216A | 2020-11-06 |
Attorney, Agent or Firm:
DYNE PATENT & LAW FIRM (KR)
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