Title:
PELLICLE FRAME, PELLICLE AND EXPOSURE ORIGINAL PLATE WITH PELLICLE, METHOD FOR PRODUCING PELLICLE FRAME, LIGHT EXPOSURE METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY PLATE
Document Type and Number:
WIPO Patent Application WO/2024/009976
Kind Code:
A1
Abstract:
The present invention relates to a pellicle frame constituting a pellicle for photolithography, wherein the pellicle frame is made of pure titanium or a titanium alloy and the surface thereof is subjected to a mechanical polishing process, an electrolytic degreasing process, and a chemical polishing process. Thus, provided are: a pellicle frame in which the amount of dust particles remaining on the surface is reduced; and a method for producing a pellicle frame.
Inventors:
YANASE YU (JP)
OSHIMA TAKESHI (JP)
NAKANO KOICHI (JP)
OSHIMA TAKESHI (JP)
NAKANO KOICHI (JP)
Application Number:
PCT/JP2023/024702
Publication Date:
January 11, 2024
Filing Date:
July 04, 2023
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
NIPPON LIGHT METAL CO (JP)
NIPPON LIGHT METAL CO (JP)
International Classes:
G03F1/64
Domestic Patent References:
| WO2008081504A1 | 2008-07-10 |
Foreign References:
| JP2022000709A | 2022-01-04 | |||
| JP2007009285A | 2007-01-18 | |||
| CN112445063A | 2021-03-05 |
Attorney, Agent or Firm:
YOSHIMIYA Mikio et al. (JP)
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