Title:
PELLICLE FRAME
Document Type and Number:
WIPO Patent Application WO/2019/050288
Kind Code:
A1
Abstract:
The present invention relates to a frame for a lithographic pellicle that is attached to a mask and used as an anti-dust membrane while manufacturing a semiconductor device, a liquid crystal display, etc. The present invention provides a pellicle frame comprising: a first surface facing a photomask; a second surface parallel to the first surface; a pair of long sides; a pair of short sides; and four corner parts at which the long sides meet the short sides, wherein the corner parts on the first surface are recessed, thereby making a difference in height across the frame. The pellicle frame according to the present invention has a height difference made at each of the corner parts thereof, and thus the surface of the photomask is not affected even by the effect of an increase in the thickness of the corner part due to attachment of a pellicle membrane.
Inventors:
CHO SANG JIN (KR)
KIM MYUNG JUN (KR)
KIM JI KANG (KR)
KIM MYUNG JUN (KR)
KIM JI KANG (KR)
Application Number:
PCT/KR2018/010401
Publication Date:
March 14, 2019
Filing Date:
September 06, 2018
Export Citation:
Assignee:
FINE SEMITECH CORP (KR)
International Classes:
G03F1/66; G03F1/62
Foreign References:
| KR20140126244A | 2014-10-30 | |||
| JP2006163035A | 2006-06-22 | |||
| KR20100014723A | 2010-02-10 | |||
| KR20130126465A | 2013-11-20 | |||
| KR20170080582A | 2017-07-10 |
Attorney, Agent or Firm:
DYNE PATENT & LAW FIRM (KR)
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